Advanced Energy Industries, Inc. Datasheets for Plasma Power Supplies

Plasma power supplies are DC and RF devices used in plasma generation equipment for applications such as sputtering, plasma etching, physical vapor deposition (PVD) coating, and chemical vapor deposition (CVD) coating.
Plasma Power Supplies: Learn more

Product Name Notes
A robust, coordinated suite of power generation specifically designed to enable advanced, high-tech coatings. Ease of operation and configuration with modular DC and pulsed-DC solutions Industry-leading reliability while powering the...
Advanced Energy’s front-line DC generator provides performance and reliability required in dual-magnetron sputtering applications. Arcs are actively managed, versus a generic pre-set arc response Less than 0.4 mJ per 1...
Advanced Energy's Pinnacle DC generators enable quality thin films and maximum process efficiency. Buy only what you need: Power options from 6 to 20 kW Produce the best films possible...
An industry workhorse, the MDX Series diligently serves low-power applications where robust, accurate power delivery is a must. Available in 500 W, 1 kW, and 1.5 kW models Excellent process...
Compact, lightweight, and air-cooled, HiLight™ RF generators are ideal for low-power, on-board applications, suiting 13.56 MHz plasma and 1 or 2 MHz processes. Economical Flexible, single-phase input Compact design Designed for use with 230...
In both process and bias applications, the Advanced Energy (AE) Pinnacle ® Diamond DC power supply provides the highest efficiency and power factor available, resulting in the lowest operating and...
Paramount RF power generators combine frequency tuning, pulsing, and complete digital control. Full digital control for dynamic response to plasma changes Customizable frequency from 400 kHz to 60 MHz and...
Pinnacle Plus+ generators deliver DC power in a pulsing configuration enabling reactive sputtering of extremely uniform, high-quality dielectric films. Charge clearing during the reverse pulse prevents arcs from developing Adjustable...
Robust and versatile, the Cesar platform provides excellent RF power delivery across a wide range of frequencies and power outputs. Customized performance without custom lead times Reliable design for maximum...
Robust, compact DC generator designed exclusively for low power applications where precision and process repeatability are critical. Enables superior film quality with less than 6 mJ/kW delivered arc energy Run-to-run...
The PEII series of power supplies are the trusted standard for dual-magnetron sputtering, as an effective vacuum cleaning tool, and in multiple PECVD applications. Reliable water-cooled design Delivers tight output...
When space is limited, but performance is critical, streamlined APEX RF generators offer various mounting options and power you can rely on. Chamber-, rack-, or frame-mount options for convenience and...
Wide-output frequency range Compact design Flexible communication protocol The versatile, variable-frequency LFGS generator (1250 W, 40 to 500 kHz) suits a wide variety of semiconductor and general plasma-processing applications, including sputtering, reactive ion etching, plasma deposition, polymerization,...