Pinnacle Plus+ generators deliver DC power in a pulsing configuration enabling reactive sputtering of extremely uniform, high-quality dielectric films.
Charge clearing during the reverse pulse prevents arcs from developing
Adjustable process through frequency and duty cycle control
Compact air-cooled design expandable in primary/secondary configurations
Advanced Energy Pinnacle® Plus+ power supplies provide all the advantages of a pulsed-DC solution for reactive processes — in an easily integrated package that increases process efficiency, reduces costs, and offers superior flexibility and latitude. Combining standard DC technology and our patented pulsed-DC technology, the Pinnacle Plus+ power supplies provide higher deposition rates, more repeatable performance, and exceptional film quality compared to complicated and expensive AC-power solutions.
Benefits
Higher deposition and yield rates
Superior film uniformity and quality
Reduced substrate damage caused by arcing
Excellent process flexibility and latitude
Repeatable performance
Features
Adjustable frequency range of 5 to 350 kHz
Variable duty cycle up to 45%
Wide voltage range — single-tap wide impedance range
Superior arc control
Dual output available for multi-chamber production
Pinnacle Plus+ generators deliver DC power in a pulsing configuration enabling reactive sputtering of extremely uniform, high-quality dielectric films.
- Charge clearing during the reverse pulse prevents arcs from developing
- Adjustable process through frequency and duty cycle control
- Compact air-cooled design expandable in primary/secondary configurations
Advanced Energy Pinnacle® Plus+ power supplies provide all the advantages of a pulsed-DC solution for reactive processes — in an easily integrated package that increases process efficiency, reduces costs, and offers superior flexibility and latitude. Combining standard DC technology and our patented pulsed-DC technology, the Pinnacle Plus+ power supplies provide higher deposition rates, more repeatable performance, and exceptional film quality compared to complicated and expensive AC-power solutions.
Benefits
- Higher deposition and yield rates
- Superior film uniformity and quality
- Reduced substrate damage caused by arcing
- Excellent process flexibility and latitude
- Repeatable performance
Features
- Adjustable frequency range of 5 to 350 kHz
- Variable duty cycle up to 45%
- Wide voltage range — single-tap wide impedance range
- Superior arc control
- Dual output available for multi-chamber production
