Wide-output frequency range
Compact design
Flexible communication protocol
The versatile, variable-frequency LFGS generator (1250 W, 40 to 500 kHz) suits a wide variety of semiconductor and general plasma-processing applications, includ
ing sputtering, reactive ion etching, plasma deposition, polymerization, and surface treatment. Its compact 19", rack-mountable, air-
cooled package eases installation and saves valuable space. With a half-bridge, class-D amplifier design, the LFGS power supply enables the lowest reflected power commercially available.
Benefits
Support a wide variety of applications
Access the lowest reflected power commercially available
Easily install
Efficiently use valuable space
Features
Variable frequency
Air cooling
Enhanced operating menu
Active front panel
Pulse mode (0 to 10 kHz) CEX operation mode 2 analog user ports
RS-232, Ethernet, and Profibus communication
- Wide-output frequency range
- Compact design
- Flexible communication protocol
The versatile, variable-frequency LFGS generator (1250 W, 40 to 500 kHz) suits a wide variety of semiconductor and general plasma-processing applications, including sputtering, reactive ion etching, plasma deposition, polymerization, and surface treatment. Its compact 19", rack-mountable, air-cooled package eases installation and saves valuable space. With a half-bridge, class-D amplifier design, the LFGS power supply enables the lowest reflected power commercially available.
Benefits
- Support a wide variety of applications
- Access the lowest reflected power commercially available
- Easily install
- Efficiently use valuable space
Features
- Variable frequency
- Air cooling
- Enhanced operating menu
- Active front panel
- Pulse mode (0 to 10 kHz) CEX operation mode 2 analog user ports
- RS-232, Ethernet, and Profibus communication
