Paramount RF power generators combine frequency tuning, pulsing, and complete digital control.
Full digital control for dynamic response to plasma changes
Customizable frequency from 400 kHz to 60 MHz and power from 100 W to 8 kW
Advanced features for control optimization and synchronization
Advance your process development with a new focus on operating flexibility. Paramount® RF generators offer wide frequency and power ranges, support multiple integration scenarios, and are equipped with standard serial or analog interfaces.
The Paramount platform’s digital architecture provides precise power management and streamlines new function integration — no lead times or hardware changes needed. High-power output and repeatable performance is achieved by real-time detection of plasma changes. And internal-protection limits facilitate reliable operation.
Benefits
Enhance plasma stability and process repeatability
Precisely control RF power
Quickly respond to plasma changes
Easily adapt to meet specific application needs
Features
Full digital control
Frequency tuning, pulsing, and pulse synchronization
Real-time power and impedance measurement
Arc management
Phase synchronization (CEX)
Paramount RF power generators combine frequency tuning, pulsing, and complete digital control.
- Full digital control for dynamic response to plasma changes
- Customizable frequency from 400 kHz to 60 MHz and power from 100 W to 8 kW
- Advanced features for control optimization and synchronization
Advance your process development with a new focus on operating flexibility. Paramount® RF generators offer wide frequency and power ranges, support multiple integration scenarios, and are equipped with standard serial or analog interfaces.
The Paramount platform’s digital architecture provides precise power management and streamlines new function integration — no lead times or hardware changes needed. High-power output and repeatable performance is achieved by real-time detection of plasma changes. And internal-protection limits facilitate reliable operation.
Benefits
- Enhance plasma stability and process repeatability
- Precisely control RF power
- Quickly respond to plasma changes
- Easily adapt to meet specific application needs
Features
- Full digital control
- Frequency tuning, pulsing, and pulse synchronization
- Real-time power and impedance measurement
- Arc management
- Phase synchronization (CEX)
