Plansee SE Datasheets for Thin Film Materials

Thin film materials are high purity materials and chemicals such as precursor gases, sputtering targets, or evaporation filaments used to form or modify thin film deposits and substrates.
Thin Film Materials: Learn more

Product Name Notes
Evaporation Coils Thermal evaporation (resistance evaporation) is a coating method used as part of the PVD process (Physical Vapor Deposition). The material that is to form the subsequent layer is heated in...
Aluminum Sputtering Target Aluminum possesses very high electrical conductivity. Together with molybdenum, it is used for metallization in thin-film transistors for TFT-LCD monitors, television sets and cell phone displays. High purity. With a...
Titanium and Zirconium Target Drills, milling machines or indexable cutting inserts: Nitride and carbide titanium (Ti) and zirconium (Zr) coatings allow you to protect your tools against wear economically and reliably. In addition, zirconium...
Copper Sputtering Target Due to its high electrical conductivity, copper is becoming increasingly popular for use in large-format, high-resolution TFT-LCD television sets. Copper is used as the electrode layer in thin-film transistors...
Plasma Spray Nozzles During plasma spraying, metal or ceramic powder is melted in a plasma arc and then propelled at high speed against the workpiece that is to be coated. In this way,...
Titanium-Diboride Target During the machining of aluminum, particles of material may adhere to the tool tip. The result: The tool has to exert more force to remove the workpiece material and wear...
Molybdenum Sputtering Target Molybdenum coatings are the crucial components of the thin-film transistors used in TFT-LCD screens. These provide instantaneous control of the individual image dots (pixels) and consequently ensure particularly sharp image...
Molybdenum-Tungsten Sputtering Target Our molybdenum tungsten alloys (MoW) offer enhanced stability against ITO, aluminum or copper etching solutions. By adding tungsten to pure molybdenum we can selectively slow down the speed of etching.
Titanium-Aluminum Target Our targets and cathodes made from titanium-aluminum (TiAl) ensure that drills, milling machines, indexable cutting inserts and other tools are protected by a hard, oxidation-resistant nitride coating (TiAlN). High feed...
Molybdenum-Tantalum Sputtering Target Thanks to its good adherence to glass and a high level of electrical conductivity, molybdenum is a popular material for electrode layers in thin-film transistors (TFT-LCD) and touch sensors (touch...
Chromium Target The hard material coatings chromium (Cr) and chromium nitride (CrN) optimally protect engine components such as piston rings against premature wear and consequently extend the useful life of important engine...
Aluminum-Chromium Target The high thermal stability and resistance to oxidation of aluminum-chromium coatings means that higher feed speeds, cutting performance and metal removal rates can be achieved without difficulty. A coating of...
Titanium-Silicon Nitride Target Together, titanium and silicon (TiSi) make an outstanding team for nitride hard material coatings. Silicon guarantees excellent resistance to oxidation while the presence of titanium ensures particularly hard coatings. When...
Tungsten Carbide Target Tungsten carbide (WC) is used for the production of DLC coatings (Diamond Like Carbon). These are particularly hard and long-lasting and protect engine parts and other automotive industry components that...
Tungsten Sputtering Target Tungsten layers are components of the thin-film transistors used in TFT-LCD screens. They are used wherever large screen formats, particularly high image definition and optimized contrasts are needed. But tungsten...
Evaporation Boats We supply evaporation boats manufactured from tungsten, molybdenum, molybdenum-lanthanum (ML), molybdenum-yttrium oxide (MY) or tantalum. Our evaporation boats offer a good level of electrical conductivity and possess low vapor...