TSI Incorporated Datasheets for Wafer and Thin Film Instrumentation

Instruments such as quartz crystal microbalance (QCM) monitors, ellipsometers, RHEED systems, imaging stations, CD-SEMs, ion mills, C-V systems specifically designed for wafer metrology or in-situ monitoring of thin film parameters during thin film or semiconductors wafer processing.
Wafer and Thin Film Instrumentation: Learn more

Product Name Notes
Auto-load 10 Nm Particle Deposition System 2300g3a - 10 Nm -- SKU: 2334 This fully automated particle deposition system deposits PSL and SiO2 spheres as small as 10 nm. Calibrate and qualify your defect inspection tools with ease, confidence, and efficiency by producing...
Auto-load 20 Nm Particle Deposition System 2300g3a - 20 Nm -- SKU:2332 This fully automated particle deposition system deposits PSL and SiO2 spheres as small as 20 nm. Calibrate and qualify your defect inspection tools with ease, confidence, and efficiency by producing...
Manual-load 10 Nm Particle Deposition System 2300g3m - 10 Nm -- SKU: 2335 This manually-loaded particle deposition system deposits PSL and SiO2 spheres as small as 10 nm. Calibrate and qualify your defect inspection tools with ease, confidence, and efficiency by producing high...
Manual-load 20 Nm Particle Deposition System 2300g3m - 20nm -- SKU: 2333 This manually-loaded particle deposition system deposits PSL and SiO2 spheres as small as 20 nm. Calibrate and qualify your defect inspection tools with ease, confidence, and efficiency by producing high...