TSI Incorporated Manual-load 10 Nm Particle Deposition System 2300g3m - 10 Nm SKU: 2335

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Manual-load 10 Nm Particle Deposition System 2300g3m - 10 Nm - SKU: 2335 - TSI Incorporated
Shoreview, MN, United States
Manual-load 10 Nm Particle Deposition System 2300g3m - 10 Nm SKU: 2335
This manually-loaded particle deposition system deposits PSL and SiO2 spheres as small as 10 nm. Calibrate and qualify your defect inspection tools with ease, confidence, and efficiency by producing high volumes of high-quality custom wafer calibration standards. Manual loading allows a wide range of substrates to be deposited including 150 mm, 200 mm, and 300 mm wafers, supporting of all of your wafer metrology applications and improving product yield.
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  TSI Incorporated
Product Category Wafer and Thin Film Instrumentation
Product Number SKU: 2335
Product Name Manual-load 10 Nm Particle Deposition System 2300g3m - 10 Nm
Form Factor Wafer Inspection And Metrology
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