Ushio America, Inc. Datasheets for Lithography Equipment

Lithography equipment transfers circuit or device patterns onto a substrate using a patterned mask and a beam of light or electrons to selectively expose a photoresist layer. Overlay metrology systems align the pattern masks or reticules.
Lithography Equipment: Learn more

Product Name Notes
Roll To Roll Lithography Tool -- UFX Currently Ushio’s proximity/projection exposure systems for flexible substrates have a track record of over 800 units. Highly efficient high-resolution exposure is achieved by a projector lens that makes full use...
Contact-proximity Aligners -- UX-3 This mask aligner uses light source and optical technologies developed by Ushio over many years. This exposure device supports not only ihg rays, but the deep UV range as well.
Manual Type Contact-proximity Aligner -- UX-1 This mask aligner uses light source and optical technologies developed by Ushio over many years. This exposure device supports not only ihg rays, but the deep UV range as well.
Full Field Projection Aligner -- UX-4 This projection aligner uses our unique large area projector lens technology, light source and other optical technologies developed by Ushio over many years. Provides one-shot exposure of up to 8-inch...
Large Field Stepper -- UX-5 & UX-7 Ushio provides specialized steppers for cutting-edge packaging applications employed in servers and PCs, and in portable devices such as smart phones and tablet PCs. The stepper is intended for package...