Ushio America, Inc. Manual Type Contact-proximity Aligner UX-1

This mask aligner uses light source and optical technologies developed by Ushio over many years. This exposure device supports not only ihg rays, but the deep UV range as well. Component Technology – Includes the world’s number one super high-pressure UV lamp – Our own irradiation optical system boasting a high degree of uniformity FEATURES & BENEFITS High resolution The highest line-space resolution of 1 um (vacuum hard contact) is achieved. Proximity lithography achieves high line-space resolution of 3 um at 20 um gap. Line width stability is also excellent with high stage flatness and gap stability. We can propose the best optical system to achieve the optimal resolution for each lithography mode according to the material. Achieves high overlay accuracy Overlay precision: achieves ±1 um during surface alignment, and ±1.5 um during back side alignment. High-precision registration accuracy is achieved by optimal alignment lighting and image processing software techniques to suit various substrates and alignment marks. Evaluation system for LCD photosensitive materials Utilizing Ushio’s light source technology, our LCD color filter exposure light source has secured a large market share. 　 We can propose simple lithographic systems for shipping inspection of LCD photosensitive materials using this technology. APPLICATIONS MEMS Crystal oscillators SAW filters RF devices Sensors Inkjet heads Diodes IGBT Power semiconductors Thyristors MOS-FETs LEDs Power amps MMICs BAW filters Acceleration sensors Inductors Passive components Solar cells R&D Materials evaluation Resist evaluation and more