Edwards Vacuum Datasheets for Thin Film Equipment

Thin film equipment uses vacuum processing for the modification of surfaces using CVD, PVD, plasma etching, and thermal oxidation or ion implantation.
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Product Name Notes
The BJD-2000 & FC-2000 are our latest PVD tools for small production or R&D. These flexible evaporation systems accept a multitude of accessories to meet almost any requirement. The BJD-2000...
The FC-3800, our latest large-scale evaporator, enables rapid processing of 6 inch diameter wafers for lift off and/or step coverage applications. In each load, this load lock system can coat...
The FC-4400A represents our largest scale design lift off oriented evaporation and our ultimate high throughput platform. This system is designed to support the metallization of thirty 6 inch wafers...
The newly designed BCD-2800 provides an upgrade and improvement option for customers processing requirements formerly filled by our VES-2550 load lock evaporation system. This mid-sized system offers tooling options that...