The FC-3800, our latest large-scale evaporator, enables rapid processing of 6 inch diameter wafers for lift off and/or step coverage applications. In each load, this load lock system can coat twenty-five 6 inch diameter wafers for lift off or thirty-six 6 inch wafers for step coverage. The 38 inch x38 inch x 28 inch box type product chamber is pumped by a high throughput 16 inch cyro pump. During wafer exchanges, the source chamber is maintained at high vacuum by the independent pumping of dedicated 10 inch cryo pump.
| Edwards Vacuum | |
|---|---|
| Product Category | Thin Film Equipment |
| Product Number | FC-3800 |
| Product Name | Temescal |
| Process | Physical Vapor Deposition; Electron Beam Evaporation |
| Applications | Research / Surface Analysis |
| Materials Processed | Metal |
| Wafer / Part Size | 152 mm (6 inch) |
