Hiden Analytical Datasheets for Wafer and Thin Film Instrumentation
Instruments such as quartz crystal microbalance (QCM) monitors, ellipsometers, RHEED systems, imaging stations, CD-SEMs, ion mills, C-V systems specifically designed for wafer metrology or in-situ monitoring of thin film parameters during thin film or semiconductors wafer processing.
Wafer and Thin Film Instrumentation: Learn more
| Product Name | Notes |
|---|---|
| IG5C 5KeV Caesium Ion Source for UHV Surface Analysis -- IG5C | Low power, high brightness, surface ionisation source coupled to a compact ion column, providing high performance in a small package. |
| IG20 5 KeV Argon or Oxygen Ion Source for UHV Surface Analysis -- IG20 | Static and Dynamic SIMSAuger Electron SpectroscopyIon Beam SputteringSurface Science StudiesRastering / Depth Profiling |
| Advanced Langmuir Probe -- ESPion | The ESPion advanced Langmuir probe for rapid, reliable and accurate plasma diagnostics for industry and academia. |
| Mass and Energy Analyzer -- EQP | The Hiden EQP is a combined Mass / Energy analyser for the analysis of positive AND negative ions, neutrals, and radicals from plasma processes. |
| ICP Plasma Workstation with EQP -- ICP | The Hiden Plasma Workstation, an integrated RF-ICP reactor / plasma analyser system for all you plasma process studies. |
| Mass and Energy Analyzer -- PSM | The PSM is a differentially pumped mass spectrometer for the analysis of secondary ions and neutrals from plasma process. |