Hiden Analytical Datasheets for Wafer and Thin Film Instrumentation

Instruments such as quartz crystal microbalance (QCM) monitors, ellipsometers, RHEED systems, imaging stations, CD-SEMs, ion mills, C-V systems specifically designed for wafer metrology or in-situ monitoring of thin film parameters during thin film or semiconductors wafer processing.
Wafer and Thin Film Instrumentation: Learn more

Product Name Notes
IG5C 5KeV Caesium Ion Source for UHV Surface Analysis -- IG5C Low power, high brightness, surface ionisation source coupled to a compact ion column, providing high performance in a small package.
IG20 5 KeV Argon or Oxygen Ion Source for UHV Surface Analysis -- IG20 Static and Dynamic SIMSAuger Electron SpectroscopyIon Beam SputteringSurface Science StudiesRastering / Depth Profiling
Advanced Langmuir Probe -- ESPion The ESPion advanced Langmuir probe for rapid, reliable and accurate plasma diagnostics for industry and academia.
Mass and Energy Analyzer -- EQP The Hiden EQP is a combined Mass / Energy analyser for the analysis of positive AND negative ions, neutrals, and radicals from plasma processes.
ICP Plasma Workstation with EQP -- ICP The Hiden Plasma Workstation, an integrated RF-ICP reactor / plasma analyser system for all you plasma process studies.
Mass and Energy Analyzer -- PSM The PSM is a differentially pumped mass spectrometer for the analysis of secondary ions and neutrals from plasma process.