Hiden Analytical ICP Plasma Workstation with EQP ICP

Name: ICP Plasma Workstation with EQP
Brand: Hiden Analytical

Description

The Hiden Plasma Workstation, an integrated RF-ICP reactor / plasma analyser system for all you plasma process studies.

Description

The Hiden Plasma Workstation, an integrated RF-ICP reactor / plasma analyser system for all you plasma process studies.

Suppliers

Company

Product

Description

Supplier Links

Livonia, MI, USA

ICP Plasma Workstation with EQP
ICP

ICP Plasma Workstation with EQP ICP

The Hiden Plasma Workstation, an integrated RF-ICP reactor / plasma analyser system for all you plasma process studies.

Supplier's Site

	Hiden Analytical
Product Category	Wafer and Thin Film Instrumentation
Product Number	ICP
Product Name	ICP Plasma Workstation with EQP
Form Factor	Monitor or instrument; Controller

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Cosmic Equipment SpA

Specs

Form Factor Monitor or instrument

Applications Wafer

Daitron Co., Ltd.

Specs

Applications CVD / PVD

JEOL USA, Inc.

Specs

Form Factor Monitor or instrument

Mounting / Loading Floor

Bruker Corporation

Specs

Technology Profilometer or AFM (optional feature); X-ray Diffractometer (optional feature)

Applications Wafer; C-S Thin Film Materials

Measurements Defects, dimples or film residues (optional feature); Roughness / Waviness (optional feature)