JST Manufacturing, Inc. Datasheets for Semiconductor Wet Process Equipment

Semiconductor wet process equipment performs a variety of wet processing applications including etching, washing, chemical mechanical polishing (CMP), and spin coating in semiconductor or microelectronics manufacturing.
Semiconductor Wet Process Equipment: Learn more

Product Name Notes
Ultrasonic Bath JST's ultrasonic baths are designed to make the most of your cleaning chemistry while taking advantage of the cleaning action of the sound waves. Coved corners eliminate particle traps and...
Heated Filtered JST's Heated Filtered bath continuously filters process chemicals in a laminar flow direction from the bottom of the bath upward over a four sided weir. The bath is design to...
Ambient Filtration Bath JST's Ambient Filtration bath continuously filters process chemicals in a laminar flow direction from the bottom of the bath upward over a four sided weir. The bath is designed...
Heated Downflow Bath JST's heated downflow baths are designed for metal lift off and removal of heavy particles that have a tendency to fall to the bottom of the tank. Filtered and...
Megasonic Bath JST's Megasonic Baths provide a high level of cleaning performance by applying high frequency energy (greater than 700 Khz) to effectively remove submicron particles via acoustic cavitation. The high...
Single Wafer Etching System JST's Single Wafer Etching and Stripping System utilizes an automated chemical spray process on a single wafer. The system includes oscillating spray nozzles, adjustable wafer speed (RPM) and precision adjustment...
Dual Rotary BOE Etching System JST offers affordable semi-automated systems in both rotary and linear transfer designs. Rotary Transfer stations can accomodate single or dual rotary arms. JST's robot uses DC servo motors for...
Ambient Static Bath Ambient Static Baths incorporate coved corners for cleanliness and a sloped bottom. JST's Ambient Static Baths incorporate coved corners for cleanliness and a sloped bottom with 3/4" port...
Static Heated Bath Designed to maintain uniform temperature for processing while meeting NEC and SEMI standards for safety. JST's Static Heated Baths are designed to maintain uniform temperature for processing while meeting...
Quick Dump Rinser JST's Quick Dump Rinser supplies Deionized (DI) water from the bottom of the bath through ports that direct the flow up and across the product’s surface. JST's Quick Dump...
The Tigress Semi Auto Two Tank System JST's two axis, front to back automated system is a compact, semi-automated system for processes that require uniformity without the high price tag. The Tigress is designed to minimize exhaust...
DI Water Overflow Rinse Baths JST's Overflow Rinse baths are slotted on all four sidewalls to provide DI water overflow to the plenum.The inside corners are constructed with coved corner design to minimize particle...
Constant Temperature Bath Maintains accurate temperature control and particle removal. JST's Constant Temperature Bath maintains accurate temperature control and particle removal. The recirculated chemistry flow enters the bottom of the process bath,...
Chemical Workstations JST's Chemical Workstations are designed for use as an exhausted work surface for laboratory applications. Even airflow is provided across the worksurface. The worksurface is liquid tight maintaining a dry...
Exhausted Workstation (EWS) JST's exhausted Workstations are designed for manual processing of 8" wafers or smaller in a class 100 or better environment. They have been certified to meet SEMI S2 and SEMI...
Fumehood Design with Ergo Column JST's fumehoods are modular in design and made to provide a safe enviroment when working with volatile chemistries. The fumehood profile encloses the entire work area. A counter balanced front...
Spinner/Hot Plate Workstation JST's Spinner and Hot Plate workstations are designed for ease of use and service. Spinner modules and/or Hot Plate modules are mounted in a sealed deck area with easily accessible...
Vertical Laminar Flow Workstation (VLF) JST's VLF is designed for manual processing of 6" or smaller wafers in a class 1,000 environment. The headcasing houses the electrical controls and is nitrogen purged. The Emergency Power...
Fully Automated Stations with or without Wafer Transfer Whether processing 6", 8", or 12" wafers or a combination, JST can design an automated wet process tool to meet your needs. Multiple platforms are available as well as a...
Liftoff/Stripping Tool Whether your metal lift off process demands a fully automated process or simply a manual configuration, JST's Lift Off Stations offer dry to dry, cost effective solutions for the removal...