MacDermid Alpha Electronics Solutions Through-Silicon Via (TSV) Plating Solutions for Advanced packaging MICROFAB ® DVF-200

Description
Product Overview MICROFAB DVF-200 is an acid copper plating process designed to fill TSVs without voids or other defects at high plating speeds. The process is specially formulated for vias with diameters ranging from 5 to 100 μm and aspect ratios of less than 10:1. Product Features Reduced Voids and Defects MICROFAB DVF-200 delivers exceptional bottom-up fill for Through-Silicon Vias. Versatile Solution MICROFAB DVF-200 is a versatile solution that exhibits ease of use for a variety of aspect ratios. Featured Applications Through-Silicon Vias (TSV) MICROFAB DVF-200 is designed to accommodate a variety of aspect ratios for TSV and interposer applications.
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Description
Product Overview MICROFAB DVF-200 is an acid copper plating process designed to fill TSVs without voids or other defects at high plating speeds. The process is specially formulated for vias with diameters ranging from 5 to 100 μm and aspect ratios of less than 10:1. Product Features Reduced Voids and Defects MICROFAB DVF-200 delivers exceptional bottom-up fill for Through-Silicon Vias. Versatile Solution MICROFAB DVF-200 is a versatile solution that exhibits ease of use for a variety of aspect ratios. Featured Applications Through-Silicon Vias (TSV) MICROFAB DVF-200 is designed to accommodate a variety of aspect ratios for TSV and interposer applications.
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Suppliers

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Through-Silicon Via (TSV) Plating Solutions for Advanced packaging - MICROFAB ® DVF-200 - MacDermid Alpha Electronics Solutions
Waterbury, CT, United States
Through-Silicon Via (TSV) Plating Solutions for Advanced packaging
MICROFAB ® DVF-200
Through-Silicon Via (TSV) Plating Solutions for Advanced packaging MICROFAB ® DVF-200
Product Overview MICROFAB DVF-200 is an acid copper plating process designed to fill TSVs without voids or other defects at high plating speeds. The process is specially formulated for vias with diameters ranging from 5 to 100 μm and aspect ratios of less than 10:1. Product Features Reduced Voids and Defects MICROFAB DVF-200 delivers exceptional bottom-up fill for Through-Silicon Vias. Versatile Solution MICROFAB DVF-200 is a versatile solution that exhibits ease of use for a variety of aspect ratios. Featured Applications Through-Silicon Vias (TSV) MICROFAB DVF-200 is designed to accommodate a variety of aspect ratios for TSV and interposer applications.

Product Overview

MICROFAB DVF-200 is an acid copper plating process designed to fill TSVs without voids or other defects at high plating speeds. The process is specially formulated for vias with diameters ranging from 5 to 100 μm and aspect ratios of less than 10:1.

Product Features

Reduced Voids and Defects

MICROFAB DVF-200 delivers exceptional bottom-up fill for Through-Silicon Vias.


Versatile Solution

MICROFAB DVF-200 is a versatile solution that exhibits ease of use for a variety of aspect ratios.

Featured Applications

Through-Silicon Vias (TSV)

MICROFAB DVF-200 is designed to accommodate a variety of aspect ratios for TSV and interposer applications.

Supplier's Site

Technical Specifications

  MacDermid Alpha Electronics Solutions
Product Category Plating Chemicals and Anodizing Chemicals
Product Number MICROFAB ® DVF-200
Product Name Through-Silicon Via (TSV) Plating Solutions for Advanced packaging
Chemical / Composition Copper Plating; Tin Plating
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