Vistec Electron Beam Lithography Group Datasheets for Lithography Equipment
Lithography equipment transfers circuit or device patterns onto a substrate using a patterned mask and a beam of light or electrons to selectively expose a photoresist layer. Overlay metrology systems align the pattern masks or reticules.
Lithography Equipment: Learn more
|The Vistec EBPG5000plus Series are a further evolution of the EBPG4 and 5 systems. The EBPG series has established a worldwide position for advanced nano-lithography applications, particularly in direct writing...|
|The Vistec EBPG5200 Series is a further evolutionary progression of Vistec's high-end electron-beam lithography systems now providing full 200mm wafer writing performance. The NEW system is available alongside the successful...|
|The Vistec SB250 electron beam lithography system has been designed as a universal and cost-effective tool for both direct write and mask making applications to allow the customers to react...|
|The Vistec SB3050 Series - now with a Cell Projection option - is our commitment to semiconductor manufacturing professionals. Designed to meet the challenges of direct patterning down to the...|