ASML Optics Datasheets for Lithography Equipment
Lithography equipment transfers circuit or device patterns onto a substrate using a patterned mask and a beam of light or electrons to selectively expose a photoresist layer. Overlay metrology systems align the pattern masks or reticules.
Lithography Equipment: Learn more
| Product Name | Notes |
|---|---|
| The pas 5500/100D i-line stepper is designed for mass production at 0.4μm and achieves extremely high throughput while maintaining the utmost versatility with its variable Numerical Aperture (NA). This stepper... | |
| The PAS 5500/1150C 193-nm Step-and-Scan system enables cost effective 90-nm ArF mass production. The PAS 5500/1150C is the solution for both 90-nm critical and non critical ArF layers. The PAS... | |
| The PAS 5500/275D is an i-line stepper stretching resolution down to 0.28 μm and beyond. It is built on the success of the proven PAS 5500/250C advanced i-line stepper. The... | |
| The PAS 5500/350C is a Deep UV stepper for 0.15-μm applications and beyond. The high productivity and low cost of ownership allow capacity extensions in existing DUV stepper fabs as... | |
| The PAS 5500/400D i-line Step-and-Scan system has a variable-NA (0.48 to 0.65) 4x projection lens, which, combined with ASML’s AERIAL Illuminator, provides 280-nm resolution. ASML’s revolutionary Step-and-Scan stage technology enables... | |
| The PAS 5500/450F is the latest and most advanced addition to the i-line Step-and-Scan family. This mass production tool is the successor of the PAS 5500/400 for non-critical applications. This... | |
| The PAS 5500/850D 248-nm Step-and-Scan system enables 110-nm mass production. Since the initial introduction of the PAS 5500/850, the PAS 5500/850 series have become the worldwide standard for both 110-nm... | |
| The TWINSCAN NXT:1950i Step-and-Scan system is a high productivity, dual stage immersion lithography tool designed for volume production 300-mm wafers at the 32-nm node and beyond. Building on the successful... | |
| The TWINSCAN XT:1000H 248-nm Step-and-Scan system is a new dual-stage KrF lithography tool with the highest NA and productivity in the industry, designed for 200-mm and 300-mm wafer production. Combining... | |
| The TWINSCAN XT:1450G 193-nm Step-and-Scan system is a high-productivity, dual-stage ArF lithography tool designed for volume 200-mm and 300-mm wafer production at 65-nm resolution. The TWINSCAN XT:1450G system combines the... | |
| The TWINSCAN XT:1700Fi Step-and-Scan system is a high-productivity, dual-stage immersion lithography tool designed for volume 300-mm wafer production at 50-nm resolution and below. One of the main features is a... | |
| The TWINSCAN XT:1900Gi Step-and-Scan system is a high-productivity, dual-stage immersion lithography tool designed for volume 300-mm wafer production at 45-nm resolution and below. Building on the successful in-line catadioptric lens... | |
| The TWINSCAN XT:1950Hi Step-and-Scan system takes single-exposure water-based immersion lithography to its limits. Combining high-productivity with ultra low k1, this dual-stage immersion lithography tool is designed for volume... | |
| The TWINSCAN XT:400G 365-nm Step-and-Scan system is an ultra high-productivity, dual-stage lithography tool designed for volume 300-mm wafer production at 350-nm resolution. The dual wafer-stage technology of the TWINSCAN platform... | |
| The TWINSCAN XT:450G 365-nm Step-and-Scan system is a high productivity, dual-stage lithography tool designed for volume production of critical i-line applications down to 220-nm resolution and beyond. The dual wafer-stage... | |
| The TWINSCAN XT:870G 248-nm Step-and-Scan system is a high-productivity, dual-stage KrF lithography tool designed for volume 300-mm wafer production at and below 110-nm resolution. Combining the imaging power of a... | |
| The TWINSCAN XT:875G 248-nm Step-and-Scan system is a high-productivity, dual-stage KrF lithography tool designed for volume 300-mm wafer production at and below 110-nm resolution. Combining the imaging power of a... |