JEOL USA, Inc. Datasheets for Lithography Equipment
Lithography equipment transfers circuit or device patterns onto a substrate using a patterned mask and a beam of light or electrons to selectively expose a photoresist layer. Overlay metrology systems align the pattern masks or reticules.
Lithography Equipment: Learn more
| Product Name | Notes |
|---|---|
| Features High Precision and High Throughput Direct Writing System Built with JEOL’s renowned Electron Optics for ultimate stability Loadable wafer up to 300 mm FOUP system optionally available In-line extendibility... | |
| Spot type Electron Beam Lithography System JBX-8100FS achieved high throughput, small footprint and electric power saving. | |
| The JBX-3050MV/S is a variable-shape electron beam lithography system for masks and reticles up to 45nm node design rule. Its advanced technology achieves high speed, high precision and high reliability. |