Electroless copper system for difficult-to-plate substrates, offering superior adhesion while maintaining structural integrity.
Product Overview
Via Dep® 4550 electroless copper system is specially designed for difficult-to-plate substrates. The 4550 process offers superior adhesion on inert surfaces and difficult structural designs while maintaining structural integrity. The zero-stress, blister-free deposit for SAP, mSAP, and flex applications ensures metallization needs on complicated hybrid devices can be met with ease. Via Dep 4550 H is formulated for horizontal lines.
Stress Free Copper Deposit
Via Dep 4550 passes IPC-TM-650 thermal stress testing for plated through-holes.
Enabling Difficult-to-Plate Substrates
Compatible with flex, rigid-flex, and rigid PCB designs for complex hybrid devices.
Delivering Operating Cost Efficiencies
Via Dep 4550 operates at low temperatures, enabling reduced operating costs. The system is also a drop-in replacement for existing electroless copper lines.
| MacDermid Alpha Electronics Solutions | |
|---|---|
| Product Category | Plating Chemicals and Anodizing Chemicals |
| Product Name | Via Dep ® 4550 |
| Chemical / Composition | Copper Plating; Electroless |