EBARA Technologies, Inc. Datasheets for Thin Film Equipment

Thin film equipment uses vacuum processing for the modification of surfaces using CVD, PVD, plasma etching, and thermal oxidation or ion implantation.
Thin Film Equipment: Learn more

Product Name Notes
Ebara's GCR abatement systems cleanly and efficiently remove carbon monoxide and PFC gases from ashing and oxide etch semiconductor waste streams. The standard GCR model targets CO gases using a...
Gas Inlet Devices Patent gas inlet devices minimize rate of restriction and automatic gas inlet plunger removes restrictions without process interruptions Second Scrubbing Chamber Five fine spray, high velocity nozzles...