This system is made for smaller production facilities, R&D facilities and universities. The system features an implosion proof 6” w x 6” d x 4” h Rectangular welded Aluminum Vacuum Chamber and a direct powered RF electrode.
Applications include medical devices, solar cells, printed circuit boards, connectors, MEMs, nanotechnology, wafer level packaging as well as many other related semiconductor processes.
| Plasma Etch, Inc. | |
|---|---|
| Product Category | MEMS Processing Equipment |
| Product Number | PE-50 |
| Product Name | Benchtop Plasma Surface Cleaner |
| Type | Laboratory or Benchtop |
| Process | Plasma Etching and Cleaning |
| Applications | MEMS; Photovoltaic or solar cell; Research / Surface Analysis; Semiconductors; Medical; Printed Circuit Boards |
| Materials Processed | Tungsten; Metal; Gallium Arsenide or Compound Semiconductors; Precious Metals |
