Plasma Etch, Inc. Datasheets for MEMS Processing Equipment

MEMS processing equipment is used to create micro-electro-mechanical systems (MEMS) sensors and wafers.
MEMS Processing Equipment: Learn more

Product Name Notes
As in all Plasma Etch systems a capacitive parallel plate design is used for the most effective plasma generation. Competitive units with glass/quartz barrel chambers cannot penetrate the vacuum containment...
This system is made for smaller production facilities, R&D facilities and universities. The system features an implosion proof 6” w x 6” d x 4” h Rectangular welded Aluminum Vacuum...
This system is made for smaller production facilities, R&D facilities and universities. The system features an implosion proof 8” w x 8” d x 4” h Rectangular welded Aluminum Vacuum...