HORIBA Instruments, Inc. Multi-Point Chemical Solution Monitor CS-100F4

Description
The CS-100F4 is a new system concept that enables multipoint chemical measurement in a single unit. The CS-100F4 further expands HORIBA’s CS series lineup, which is known for its high-precision concentration monitoring of the various chemicals used in the etching and cleaning processes for semiconductor manufacturing. Sampling cells (up to four points) are connected directly to the internal piping of the cleaning unit by fiber optic cable and the transmission of optical signals allows inline real-time measurement. As well as improving cost savings and space utilization, this multipoint inline measurement delivers optimal control of the many chemicals used in semiconductor etching and cleaning processes. Example of installation:
Description
The CS-100F4 is a new system concept that enables multipoint chemical measurement in a single unit. The CS-100F4 further expands HORIBA’s CS series lineup, which is known for its high-precision concentration monitoring of the various chemicals used in the etching and cleaning processes for semiconductor manufacturing. Sampling cells (up to four points) are connected directly to the internal piping of the cleaning unit by fiber optic cable and the transmission of optical signals allows inline real-time measurement. As well as improving cost savings and space utilization, this multipoint inline measurement delivers optimal control of the many chemicals used in semiconductor etching and cleaning processes. Example of installation:

Suppliers

Company
Product
Description
Supplier Links
Multi-Point Chemical Solution Monitor - CS-100F4 - HORIBA Instruments, Inc.
Irvine, CA, United States
Multi-Point Chemical Solution Monitor
CS-100F4
Multi-Point Chemical Solution Monitor CS-100F4
The CS-100F4 is a new system concept that enables multipoint chemical measurement in a single unit. The CS-100F4 further expands HORIBA’s CS series lineup, which is known for its high-precision concentration monitoring of the various chemicals used in the etching and cleaning processes for semiconductor manufacturing. Sampling cells (up to four points) are connected directly to the internal piping of the cleaning unit by fiber optic cable and the transmission of optical signals allows inline real-time measurement. As well as improving cost savings and space utilization, this multipoint inline measurement delivers optimal control of the many chemicals used in semiconductor etching and cleaning processes. Example of installation:

The CS-100F4 is a new system concept that enables multipoint chemical measurement in a single unit. The CS-100F4 further expands HORIBA’s CS series lineup, which is known for its high-precision concentration monitoring of the various chemicals used in the etching and cleaning processes for semiconductor manufacturing. Sampling cells (up to four points) are connected directly to the internal piping of the cleaning unit by fiber optic cable and the transmission of optical signals allows inline real-time measurement. As well as improving cost savings and space utilization, this multipoint inline measurement delivers optimal control of the many chemicals used in semiconductor etching and cleaning processes.

Example of installation:

Supplier's Site

Technical Specifications

  HORIBA Instruments, Inc.
Product Category Conductivity and Resistivity Meters
Product Number CS-100F4
Product Name Multi-Point Chemical Solution Monitor
Water Quality Parameters Measures Conductivity / Dissolved Solids
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