Sensitive to broadband UV exposure (i‑, h‑, and g‑line), SU‑8 TF 6000 provides excellent patterning performance for advanced microfabrication.
Available in five optimized viscosities, it produces low‑defect coatings with film thicknesses from ~0.4 to 16 μm in a single coat, making it ideal for precision microlithography and reliable thin‑film applications.
Key Features
Photoimageable thin films with high resolution i-Line patterning capability (sub-0.5 µm lines/spaces on silicon)
Broadband, i-Line, g-Line and h-Line sensitivity
Low temperature cure (< 150°C)
Highly uniform coatings and good adhesion to rigid and flexible substrates
Outstanding thermal and chemical resistance
Sensitive to broadband UV exposure (i‑, h‑, and g‑line), SU‑8 TF 6000 provides excellent patterning performance for advanced microfabrication.
Available in five optimized viscosities, it produces low‑defect coatings with film thicknesses from ~0.4 to 16 μm in a single coat, making it ideal for precision microlithography and reliable thin‑film applications.
Key Features
- Photoimageable thin films with high resolution i-Line patterning capability (sub-0.5 µm lines/spaces on silicon)
- Broadband, i-Line, g-Line and h-Line sensitivity
- Low temperature cure (< 150°C)
- Highly uniform coatings and good adhesion to rigid and flexible substrates
- Outstanding thermal and chemical resistance
