Kayaku Advanced Materials, Inc. Micro Resist Technology mr-EBL 6000

Description
Negative photoresist series well suited for e-beam and deep UV exposure in the manufacturing of semiconductor devices. High resolution capability (~ 40 – 50 nm) High wet and dry etch resistance Aqueous alkaline development Easy to remove
  • Micro Resist Technology - mr-EBL 6000 - Kayaku Advanced Materials, Inc.
    Kayaku Advanced Materials, Inc.
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Description
Negative photoresist series well suited for e-beam and deep UV exposure in the manufacturing of semiconductor devices. High resolution capability (~ 40 – 50 nm) High wet and dry etch resistance Aqueous alkaline development Easy to remove
Request a Quote

Suppliers

Company
Product
Description
Supplier Links
Micro Resist Technology - mr-EBL 6000 - Kayaku Advanced Materials, Inc.
Kayaku Advanced Materials, Inc.
Westborough, MA, United States
Micro Resist Technology
mr-EBL 6000
Micro Resist Technology mr-EBL 6000
Negative photoresist series well suited for e-beam and deep UV exposure in the manufacturing of semiconductor devices. High resolution capability (~ 40 – 50 nm) High wet and dry etch resistance Aqueous alkaline development Easy to remove

Negative photoresist series well suited for e-beam and deep UV exposure in the manufacturing of semiconductor devices.

  • High resolution capability (~ 40 – 50 nm)
  • High wet and dry etch resistance
  • Aqueous alkaline development
  • Easy to remove
Supplier's Site

Technical Specifications

  Kayaku Advanced Materials, Inc.
Product Category Thick Film Materials
Product Number mr-EBL 6000
Product Name Micro Resist Technology
Thick Film Type Resistor
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