Kayaku Advanced Materials, Inc. Micro Resist Technology mr-NIL200

Description
Low viscosity, solvent-free photo-curable NIL resist specifically designed for use with rigid and gas-impermeable working stamps like COC, COP, OrmoStamp®, or glass. Mask for pattern transfer processes (dry and wet etching) No adhesion promoter or primer necessary Very low release forces No oxygen inhibition
  • Micro Resist Technology - mr-NIL200 - Kayaku Advanced Materials, Inc.
    Kayaku Advanced Materials, Inc.
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Description
Low viscosity, solvent-free photo-curable NIL resist specifically designed for use with rigid and gas-impermeable working stamps like COC, COP, OrmoStamp®, or glass. Mask for pattern transfer processes (dry and wet etching) No adhesion promoter or primer necessary Very low release forces No oxygen inhibition
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Suppliers

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Product
Description
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Micro Resist Technology - mr-NIL200 - Kayaku Advanced Materials, Inc.
Kayaku Advanced Materials, Inc.
Westborough, MA, United States
Micro Resist Technology
mr-NIL200
Micro Resist Technology mr-NIL200
Low viscosity, solvent-free photo-curable NIL resist specifically designed for use with rigid and gas-impermeable working stamps like COC, COP, OrmoStamp®, or glass. Mask for pattern transfer processes (dry and wet etching) No adhesion promoter or primer necessary Very low release forces No oxygen inhibition

Low viscosity, solvent-free photo-curable NIL resist specifically designed for use with rigid and gas-impermeable working stamps like COC, COP, OrmoStamp®, or glass.

  • Mask for pattern transfer processes (dry and wet etching)
  • No adhesion promoter or primer necessary
  • Very low release forces
  • No oxygen inhibition
Supplier's Site

Technical Specifications

  Kayaku Advanced Materials, Inc.
Product Category Thick Film Materials
Product Number mr-NIL200
Product Name Micro Resist Technology
Thick Film Type Resistor
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