Silicon-containing thermal nanoimprint resist for the fabrication of high aspect ratio patterns
Excellent flowability
Imprints can be performed at moderate temperatures in the range of 110 – 140°C.
Superior demolding characteristics
Kayaku Advanced Materials, Inc.
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Description
Silicon-containing thermal nanoimprint resist for the fabrication of high aspect ratio patterns
Excellent flowability
Imprints can be performed at moderate temperatures in the range of 110 – 140°C.
Superior demolding characteristics
Silicon-containing thermal nanoimprint resist for the fabrication of high aspect ratio patterns
Excellent flowability
Imprints can be performed at moderate temperatures in the range of 110 – 140°C.
Superior demolding characteristics
Silicon-containing thermal nanoimprint resist for the fabrication of high aspect ratio patterns
Excellent flowability
Imprints can be performed at moderate temperatures in the range of 110 – 140°C.
