Plasma Etch, Inc. Benchtop Plasma Cleaner PE-50 XL

Description
As in all Plasma Etch systems a capacitive parallel plate design is used for the most effective plasma generation. Competitive units with glass/quartz barrel chambers cannot penetrate the vacuum containment vessel and therefore are restricted to inductive coupling using an RF coil wrapped around the exterior of the chamber.This is an inefficient method resulting in loss of power input and considerably lower etch/clean removal rates.The PE-50 is comprised of components made in the USA and is built in and supported from our Carson City, NV headquarters with the best customer service available in the industry.
  • Benchtop Plasma Cleaner - PE-50 XL - Plasma Etch, Inc.
    Plasma Etch, Inc.
Datasheet
Description
As in all Plasma Etch systems a capacitive parallel plate design is used for the most effective plasma generation. Competitive units with glass/quartz barrel chambers cannot penetrate the vacuum containment vessel and therefore are restricted to inductive coupling using an RF coil wrapped around the exterior of the chamber.This is an inefficient method resulting in loss of power input and considerably lower etch/clean removal rates.The PE-50 is comprised of components made in the USA and is built in and supported from our Carson City, NV headquarters with the best customer service available in the industry.
Datasheet

Suppliers

Company
Product
Description
Supplier Links
Benchtop Plasma Cleaner - PE-50 XL - Plasma Etch, Inc.
Plasma Etch, Inc.
Carson City, NV, USA
Benchtop Plasma Cleaner
PE-50 XL
Benchtop Plasma Cleaner PE-50 XL
As in all Plasma Etch systems a capacitive parallel plate design is used for the most effective plasma generation. Competitive units with glass/quartz barrel chambers cannot penetrate the vacuum containment vessel and therefore are restricted to inductive coupling using an RF coil wrapped around the exterior of the chamber.This is an inefficient method resulting in loss of power input and considerably lower etch/clean removal rates.The PE-50 is comprised of components made in the USA and is built in and supported from our Carson City, NV headquarters with the best customer service available in the industry.

As in all Plasma Etch systems a capacitive parallel plate design is used for the most effective plasma generation. Competitive units with glass/quartz barrel chambers cannot penetrate the vacuum containment vessel and therefore are restricted to inductive coupling using an RF coil wrapped around the exterior of the chamber.This is an inefficient method resulting in loss of power input and considerably lower etch/clean removal rates.The PE-50 is comprised of components made in the USA and is built in and supported from our Carson City, NV headquarters with the best customer service available in the industry.

Supplier's Site Datasheet

Technical Specifications

  Plasma Etch, Inc.
Product Category MEMS Processing Equipment
Product Number PE-50 XL
Product Name Benchtop Plasma Cleaner
Type Laboratory or Benchtop
Process Plasma Etching and Cleaning
Applications MEMS; Photovoltaic or solar cell; Research / Surface Analysis; Semiconductors; Medical; Printed Circuit Boards
Materials Processed Tungsten; Metal; Gallium Arsenide or Compound Semiconductors; Precious Metals
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