Plasma Etch, Inc. Benchtop Plasma Cleaner PE-50 XL

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Benchtop Plasma Cleaner - PE-50 XL - Plasma Etch, Inc.
Carson City, NV, USA
Benchtop Plasma Cleaner PE-50 XL
As in all Plasma Etch systems a capacitive parallel plate design is used for the most effective plasma generation. Competitive units with glass/quartz barrel chambers cannot penetrate the vacuum containment vessel and therefore are restricted to inductive coupling using an RF coil wrapped around the exterior of the chamber.This is an inefficient method resulting in loss of power input and considerably lower etch/clean removal rates.The PE-50 is comprised of components made in the USA and is built in and supported from our Carson City, NV headquarters with the best customer service available in the industry.
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Technical Specifications

  Plasma Etch, Inc.
Product Category MEMS Processing Equipment
Product Number PE-50 XL
Product Name Benchtop Plasma Cleaner
Materials Processed Tungsten; Metal; Gallium Arsenide or Compound Semiconductors; Precious Metals
Type Laboratory or Benchtop
Applications MEMS; Photovoltaic or solar cell; Research / Surface Analysis; Semiconductors; Medical; Printed Circuit Boards
Facilities Required 120VAC 60 Hz @ 15 A
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