PTB Sales, Inc. Advanced Energy Match Networks RFX II 3000 Package

The Advanced Energy E'Wave bipolar pulsed DC power supply improves surface uniformity and reduces additive consumption for the copper-plating phase of dual-damascene process flow (DDPF) applications, giving you a competitive edge whether you're electroplating wafers in a production environment or developing new copper processes. The E'Wave power supply offers up to three channels, each of which has an independently driven bipolar power source and is capable of producing, storing and running up to 15 current-controlled or voltage-controlled waveforms.