PTB Sales, Inc. Advanced Energy MDX DC Magnetron E'Wave

Description
The Advanced Energy E'Wave bipolar pulsed DC power supply improves surface uniformity and reduces additive consumption for the copper-plating phase of dual-damascene process flow (DDPF) applications, giving you a competitive edge whether you're electroplating wafers in a production environment or developing new copper processes. The E'Wave power supply offers up to three channels, each of which has an independently driven bipolar power source and is capable of producing, storing, and running up to 15 current-controlled or voltage-controlled waveforms.
Description
The Advanced Energy E'Wave bipolar pulsed DC power supply improves surface uniformity and reduces additive consumption for the copper-plating phase of dual-damascene process flow (DDPF) applications, giving you a competitive edge whether you're electroplating wafers in a production environment or developing new copper processes. The E'Wave power supply offers up to three channels, each of which has an independently driven bipolar power source and is capable of producing, storing, and running up to 15 current-controlled or voltage-controlled waveforms.

Suppliers

Company
Product
Description
Supplier Links
Advanced Energy MDX DC Magnetron - E'Wave - PTB Sales, Inc.
Azusa, CA, United States
Advanced Energy MDX DC Magnetron
E'Wave
Advanced Energy MDX DC Magnetron E'Wave
The Advanced Energy E'Wave bipolar pulsed DC power supply improves surface uniformity and reduces additive consumption for the copper-plating phase of dual-damascene process flow (DDPF) applications, giving you a competitive edge whether you're electroplating wafers in a production environment or developing new copper processes. The E'Wave power supply offers up to three channels, each of which has an independently driven bipolar power source and is capable of producing, storing, and running up to 15 current-controlled or voltage-controlled waveforms.

The Advanced Energy E'Wave bipolar pulsed DC power supply improves surface uniformity and reduces additive consumption for the copper-plating phase of dual-damascene process flow (DDPF) applications, giving you a competitive edge whether you're electroplating wafers in a production environment or developing new copper processes. The E'Wave power supply offers up to three channels, each of which has an independently driven bipolar power source and is capable of producing, storing, and running up to 15 current-controlled or voltage-controlled waveforms.

Supplier's Site

Technical Specifications

  PTB Sales, Inc.
Product Category Power Supplies
Product Number E'Wave
Product Name Advanced Energy MDX DC Magnetron
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