Plasma Etch, Inc. Reactive Ion Etching System BT-1

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Reactive Ion Etching System - BT-1 - Plasma Etch, Inc.
Carson City, NV, USA
Reactive Ion Etching System BT-1
Benefits to you are better adhesion or marking, cleaner parts with less labor and reduced chemical expense by eliminating unwelcome and often expensive chemical waste associated with cleaning and priming. The large all aluminum chamber accommodates a generously sized active processing surface, our standard configuration of five levels of processing shelves provides you with 2100 square inches of useable plasma processing area.

Technical Specifications

  Plasma Etch, Inc.
Product Category Thin Film Equipment
Product Number BT-1
Product Name Reactive Ion Etching System
Materials Processed Tungsten; Metal; Gallium Arsenide or Compound Semiconductors; Precious Metals
Type Free Standing System
Applications Research / Surface Analysis; Printed Circuit Boards
Facilities Required AC Service, 120/208 VAC, 50/60 Hz
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