Matexcel Graphene Film on Silicon Oxide Substrates GRA-315

Description

Type: P type heavily doped (R: 3*3Ω10cm) Thickness: 525+20μm Thickness of oxide layer: 300nm Layers: single layer or muti-layers (<10) Size: 1*1cm, 2*2cm, 5*5cm Coverage rate: 97% or 85%

Matexcel

Datasheet

Description

Type: P type heavily doped (R: 3*3Ω10cm) Thickness: 525+20μm Thickness of oxide layer: 300nm Layers: single layer or muti-layers (<10) Size: 1*1cm, 2*2cm, 5*5cm Coverage rate: 97% or 85%

Datasheet

Suppliers

Company

Product

Description

Supplier Links

Matexcel

Shirley, NY, United States

Graphene Film on Silicon Oxide Substrates
GRA-315

Graphene Film on Silicon Oxide Substrates GRA-315

Type: P type heavily doped (R: 3*3Ω10cm) Thickness: 525+20μm Thickness of oxide layer: 300nm Layers: single layer or muti-layers (<10) Size: 1*1cm, 2*2cm, 5*5cm Coverage rate: 97% or 85%

Supplier's Site

Datasheet

Technical Specifications

	Matexcel
Product Category	Industrial Ceramic Materials
Product Number	GRA-315
Product Name	Graphene Film on Silicon Oxide Substrates
Material Type	Silicate / Clay

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