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Comdel, Inc. CX Series - High Frequency RF Power CX 600/H

Description
Proven Reliability in Plasma Vacuum Systems Worldwide Performance: The CX series power supplies start at power ranges from 600 to 2500 Watts with fixed frequencies from 2 MHz to 30 MHz, and frequency agile capability up to 10% bandwidth. The solid-state design provides low cost of ownership with high reliability. Applications: The CX series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems, and solar photovoltaic applications. Features: Standard fixed frequencies: 2 MHz, 3.39 MHz, 13.56 MHz, 27.12 MHz Patented S-Technology provides ultra-stable output. This stabilizing technology optimizes amplifier performance, reducing power-gain changes caused by plasma impedance fluctuations. ETL Marked for product safety and SEMI F47 compliant Local control via encoder and softkey inputs Standard RS-232 and analog/digital control
Datasheet

Suppliers

Company
Product
Description
Supplier Links
CX Series - High Frequency RF Power - CX 600/H - Comdel, Inc.
Gloucester, MA, USA
CX Series - High Frequency RF Power
CX 600/H
CX Series - High Frequency RF Power CX 600/H
Proven Reliability in Plasma Vacuum Systems Worldwide Performance: The CX series power supplies start at power ranges from 600 to 2500 Watts with fixed frequencies from 2 MHz to 30 MHz, and frequency agile capability up to 10% bandwidth. The solid-state design provides low cost of ownership with high reliability. Applications: The CX series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems, and solar photovoltaic applications. Features: Standard fixed frequencies: 2 MHz, 3.39 MHz, 13.56 MHz, 27.12 MHz Patented S-Technology provides ultra-stable output. This stabilizing technology optimizes amplifier performance, reducing power-gain changes caused by plasma impedance fluctuations. ETL Marked for product safety and SEMI F47 compliant Local control via encoder and softkey inputs Standard RS-232 and analog/digital control

Proven Reliability in Plasma Vacuum Systems Worldwide

Performance:
The CX series power supplies start at power ranges from 600 to 2500 Watts with fixed frequencies from 2 MHz to 30 MHz, and frequency agile capability up to 10% bandwidth. The solid-state design provides low cost of ownership with high reliability.
Applications:
The CX series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems, and solar photovoltaic applications.

Features:

  • Standard fixed frequencies: 2 MHz,
    3.39 MHz, 13.56 MHz, 27.12 MHz
  • Patented S-Technology provides ultra-stable output. This stabilizing technology optimizes amplifier performance, reducing power-gain changes caused by plasma impedance fluctuations.
  • ETL Marked for product safety and SEMI F47 compliant
  • Local control via encoder and softkey inputs
  • Standard RS-232 and analog/digital control
Supplier's Site Datasheet

Technical Specifications

  Comdel, Inc.
Product Category Power Supplies
Product Number CX 600/H
Product Name CX Series - High Frequency RF Power
Type RF Generator; Plasma Power Supply
Form Factor Rack Mount
Applications High Frequency, Semiconductor/Thin Film, Etch, Parallel Plate, RF Sputtering
Features Adjustable Frequency; Pure Sine Output; Active Front Panel with Full Controls
DC Output Power 600 watts
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