Comdel, Inc. CPS Series - High Frequency RF Power CPS 1001

Description
Solid, Reliable Engineering that Improves Process Results Performance: With millions of hours in the field, Comdel’s CPS series generators have proven their ability to withstand erratic loads. Patented S-Technology provides optimized amplifier performance for ultra-stable output by reducing power gain changes due to plasma impedance fluctuations. S-Technology helps eliminate headaches from transmission line length, mismatch conditions and process reliability issues. Applications: The CPS series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems. Features: Solid state for long life and low maintenance Class “C” linear design assures stability ETL Marked and SEMI F47 compliant Control circuitry ensures consistency during high VSWR conditions Output transistors are beta-matched to assure reliability Broadband, low “Q” circuits inhibit “squeeging” and self-resonant oscillations
Datasheet
Description
Solid, Reliable Engineering that Improves Process Results Performance: With millions of hours in the field, Comdel’s CPS series generators have proven their ability to withstand erratic loads. Patented S-Technology provides optimized amplifier performance for ultra-stable output by reducing power gain changes due to plasma impedance fluctuations. S-Technology helps eliminate headaches from transmission line length, mismatch conditions and process reliability issues. Applications: The CPS series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems. Features: Solid state for long life and low maintenance Class “C” linear design assures stability ETL Marked and SEMI F47 compliant Control circuitry ensures consistency during high VSWR conditions Output transistors are beta-matched to assure reliability Broadband, low “Q” circuits inhibit “squeeging” and self-resonant oscillations
Datasheet

Suppliers

Company
Product
Description
Supplier Links
CPS Series - High Frequency RF Power - CPS 1001 - Comdel, Inc.
Gloucester, MA, USA
CPS Series - High Frequency RF Power
CPS 1001
CPS Series - High Frequency RF Power CPS 1001
Solid, Reliable Engineering that Improves Process Results Performance: With millions of hours in the field, Comdel’s CPS series generators have proven their ability to withstand erratic loads. Patented S-Technology provides optimized amplifier performance for ultra-stable output by reducing power gain changes due to plasma impedance fluctuations. S-Technology helps eliminate headaches from transmission line length, mismatch conditions and process reliability issues. Applications: The CPS series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems. Features: Solid state for long life and low maintenance Class “C” linear design assures stability ETL Marked and SEMI F47 compliant Control circuitry ensures consistency during high VSWR conditions Output transistors are beta-matched to assure reliability Broadband, low “Q” circuits inhibit “squeeging” and self-resonant oscillations

Solid, Reliable Engineering that Improves Process Results

Performance:
With millions of hours in the field, Comdel’s CPS series generators have proven their ability to withstand erratic loads. Patented S-Technology provides optimized amplifier performance for ultra-stable output by reducing power gain changes due to plasma impedance fluctuations. S-Technology helps eliminate headaches from transmission line length, mismatch conditions and process reliability issues.
Applications:
The CPS series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, RIE, parallel plate, ICP, RF sputtering, CVD and PVD, as well as induction and dielectric heating processes in industrial systems.

Features:

  • Solid state for long life and low maintenance
  • Class “C” linear design assures stability
  • ETL Marked and SEMI F47 compliant
  • Control circuitry ensures consistency during high VSWR conditions
  • Output transistors are beta-matched to assure reliability
  • Broadband, low “Q” circuits inhibit “squeeging” and self-resonant oscillations
Supplier's Site Datasheet

Technical Specifications

  Comdel, Inc.
Product Category Power Supplies
Product Number CPS 1001
Product Name CPS Series - High Frequency RF Power
Type RF Generator; Plasma Power Supply
Form Factor Rack Mount
Applications High Frequency, Semiconductor/Thin Film, Etch, RIE, ICP, RF Sputtering, CVD
Features Adjustable Frequency (optional feature); Pure Sine Output; Custom Configured Interface
DC Output Power 1000 watts
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