Precision Polymer Engineering Ltd. Ultra-Pure O-Rings Nanofluor®

Description
Nanofluor® elastomers can be considered as hybrid materials, bridging a gap between the low cost of fluoroelastomer (FKM) and high cost of perfluoroelastomer (FFKM) polymer types. The range includes a fully organic ultra-low outgassing material and an inorganic filled grade with unique nano-filler to reduce erosion rates. The nano-filled material provides a chemical inertness only seen in much more costly FFKM grades and been developed for plasma ash or resist strip, chlorine and CxFy based etch processes. Nanofluor® grades provide some of the lowest trace metal contamination levels available from elastomer seals and ultra-low permeation rates. Key Material Attributes: Ultra pure with extremely low trace metal contaminants which may cause electrical yield problems. Excellent plasma resistance – ideal for most plasma chemistries except high F-radical processes. Plasma resistance comparable or superior to many competitive pure FFKM grades Low coefficient of thermal expansion Retro-fits existing O-ring grooves (including FKM & FFKM grooves) Low permeation Low out-gassing
Request a Quote Datasheet
Description
Nanofluor® elastomers can be considered as hybrid materials, bridging a gap between the low cost of fluoroelastomer (FKM) and high cost of perfluoroelastomer (FFKM) polymer types. The range includes a fully organic ultra-low outgassing material and an inorganic filled grade with unique nano-filler to reduce erosion rates. The nano-filled material provides a chemical inertness only seen in much more costly FFKM grades and been developed for plasma ash or resist strip, chlorine and CxFy based etch processes. Nanofluor® grades provide some of the lowest trace metal contamination levels available from elastomer seals and ultra-low permeation rates. Key Material Attributes: Ultra pure with extremely low trace metal contaminants which may cause electrical yield problems. Excellent plasma resistance – ideal for most plasma chemistries except high F-radical processes. Plasma resistance comparable or superior to many competitive pure FFKM grades Low coefficient of thermal expansion Retro-fits existing O-ring grooves (including FKM & FFKM grooves) Low permeation Low out-gassing
Request a Quote Datasheet

Suppliers

Company
Product
Description
Supplier Links
Ultra-Pure O-Rings - Nanofluor® - Precision Polymer Engineering Ltd.
Brenham, TX, United States
Ultra-Pure O-Rings
Nanofluor®
Ultra-Pure O-Rings Nanofluor®
Nanofluor® elastomers can be considered as hybrid materials, bridging a gap between the low cost of fluoroelastomer (FKM) and high cost of perfluoroelastomer (FFKM) polymer types. The range includes a fully organic ultra-low outgassing material and an inorganic filled grade with unique nano-filler to reduce erosion rates. The nano-filled material provides a chemical inertness only seen in much more costly FFKM grades and been developed for plasma ash or resist strip, chlorine and CxFy based etch processes. Nanofluor® grades provide some of the lowest trace metal contamination levels available from elastomer seals and ultra-low permeation rates. Key Material Attributes: Ultra pure with extremely low trace metal contaminants which may cause electrical yield problems. Excellent plasma resistance – ideal for most plasma chemistries except high F-radical processes. Plasma resistance comparable or superior to many competitive pure FFKM grades Low coefficient of thermal expansion Retro-fits existing O-ring grooves (including FKM & FFKM grooves) Low permeation Low out-gassing

Nanofluor® elastomers can be considered as hybrid materials, bridging a gap between the low cost of fluoroelastomer (FKM) and high cost of perfluoroelastomer (FFKM) polymer types.

The range includes a fully organic ultra-low outgassing material and an inorganic filled grade with unique nano-filler to reduce erosion rates. The nano-filled material provides a chemical inertness only seen in much more costly FFKM grades and been developed for plasma ash or resist strip, chlorine and CxFy based etch processes.

Nanofluor® grades provide some of the lowest trace metal contamination levels available from elastomer seals and ultra-low permeation rates.

Key Material Attributes:

  • Ultra pure with extremely low trace metal contaminants which may cause electrical yield problems.
  • Excellent plasma resistance – ideal for most plasma chemistries except high F-radical processes.
  • Plasma resistance comparable or superior to many competitive pure FFKM grades
  • Low coefficient of thermal expansion
  • Retro-fits existing O-ring grooves (including FKM & FFKM grooves)
  • Low permeation
  • Low out-gassing
Supplier's Site Datasheet
Ultra-Pure Elastomer Seals - Nanofluor® - Precision Polymer Engineering Ltd.
Brenham, TX, United States
Ultra-Pure Elastomer Seals
Nanofluor®
Ultra-Pure Elastomer Seals Nanofluor®
Nanofluor® elastomers can be considered as hybrid materials, bridging a gap between the low cost of fluoroelastomer (FKM) and high cost of perfluoroelastomer (FFKM) polymer types. The range includes a fully organic ultra-low outgassing material and an inorganic filled grade with unique nano-filler to reduce erosion rates. The nano-filled material provides a chemical inertness only seen in much more costly FFKM grades and been developed for plasma ash or resist strip, chlorine and CxFy based etch processes. Nanofluor® grades provide some of the lowest trace metal contamination levels available from elastomer seals and ultra-low permeation rates. Key Material Attributes: Ultra pure with extremely low trace metal contaminants which may cause electrical yield problems. Excellent plasma resistance – ideal for most plasma chemistries except high F-radical processes. Plasma resistance comparable or superior to many competitive pure FFKM grades Low coefficient of thermal expansion Retro-fits existing O-ring grooves (including FKM & FFKM grooves) Low permeation Low out-gassing

Nanofluor® elastomers can be considered as hybrid materials, bridging a gap between the low cost of fluoroelastomer (FKM) and high cost of perfluoroelastomer (FFKM) polymer types.

The range includes a fully organic ultra-low outgassing material and an inorganic filled grade with unique nano-filler to reduce erosion rates. The nano-filled material provides a chemical inertness only seen in much more costly FFKM grades and been developed for plasma ash or resist strip, chlorine and CxFy based etch processes.

Nanofluor® grades provide some of the lowest trace metal contamination levels available from elastomer seals and ultra-low permeation rates.

Key Material Attributes:

  • Ultra pure with extremely low trace metal contaminants which may cause electrical yield problems.
  • Excellent plasma resistance – ideal for most plasma chemistries except high F-radical processes.
  • Plasma resistance comparable or superior to many competitive pure FFKM grades
  • Low coefficient of thermal expansion
  • Retro-fits existing O-ring grooves (including FKM & FFKM grooves)
  • Low permeation
  • Low out-gassing
Supplier's Site Datasheet

Technical Specifications

  Precision Polymer Engineering Ltd. Precision Polymer Engineering Ltd.
Product Category O-rings O-rings
Product Number Nanofluor® Nanofluor®
Product Name Ultra-Pure O-Rings Ultra-Pure Elastomer Seals
O-ring Size Available in all 'AS568A-' standard sizes (001-475); Available in all 'AS568A-' boss gasket sizes (901- and up); Available in British Standard metric sizes (e.g. 'BS'); Available in JIS standard sizes (e.g. G, P, S and V ) (optional feature) Available in all 'AS568A-' standard sizes (001-475); Available in all 'AS568A-' boss gasket sizes (901- and up); Available in British Standard metric sizes (e.g. 'BS')
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