HORIBA Instruments, Inc. Gas Monitor for Chamber Cleaning End Point Monitoring IR-200

Description
The IR-200 monitors SiF4 gas concentration in real time and identifies the cleaning end-point based on SiF4 gas concentrations. Monitor SiF4 concentration up to 5000 ppm Compact design Can be installed into exhaust lines In addition to SiF4, this gas monitor can be used to measure CIF3 and other gases.
Description
The IR-200 monitors SiF4 gas concentration in real time and identifies the cleaning end-point based on SiF4 gas concentrations. Monitor SiF4 concentration up to 5000 ppm Compact design Can be installed into exhaust lines In addition to SiF4, this gas monitor can be used to measure CIF3 and other gases.

Suppliers

Company
Product
Description
Supplier Links
Gas Monitor for Chamber Cleaning End Point Monitoring - IR-200 - HORIBA Instruments, Inc.
Irvine, CA, United States
Gas Monitor for Chamber Cleaning End Point Monitoring
IR-200
Gas Monitor for Chamber Cleaning End Point Monitoring IR-200
The IR-200 monitors SiF4 gas concentration in real time and identifies the cleaning end-point based on SiF4 gas concentrations. Monitor SiF4 concentration up to 5000 ppm Compact design Can be installed into exhaust lines In addition to SiF4, this gas monitor can be used to measure CIF3 and other gases.

The IR-200 monitors SiF4 gas concentration in real time and identifies the cleaning end-point based on SiF4 gas concentrations.

  • Monitor SiF4 concentration up to 5000 ppm
  • Compact design
  • Can be installed into exhaust lines
  • In addition to SiF4, this gas monitor can be used to measure CIF3 and other gases.
Supplier's Site

Technical Specifications

  HORIBA Instruments, Inc.
Product Category Gas Instruments
Product Number IR-200
Product Name Gas Monitor for Chamber Cleaning End Point Monitoring
Measurement Type Trace
Application Process Gas
Gas Types (SiF4, CIF3 and other gases)
Electrical Outputs Current
Instrument Type Monitor
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