Hitachi High Technologies America, Inc. Wafer Surface Inspection System LS Series

Description
The wafer surface inspection system LS series can detect defects on unpatterned wafers with a mirror-finished surface. Applied technology of laser scattering achieves high sensitivity and high throughput detection of small contaminants and various types of defects on wafer surfaces prior to patterning. Wafer surface defects such as shallow scratch flatness defects, water marks, epi stacking faults, protrusions by the polishing process, and flatness defects caused during deposition cause problems in next-generation processes. The LS series achieve high sensitivity by detecting the light scattered from defects while suppressing background noise from the wafer surface. It is widely adopted to control contamination in the manufacturing of semiconductors on the 10-nm scale, and for delivery and incoming wafer quality control. For device manufacturer: incoming inspection and process tool monitoring use For tool and material manufacturer: process and material evaluation use For wafer supplier: outgoing inspection with wafer edge handling use
Description
The wafer surface inspection system LS series can detect defects on unpatterned wafers with a mirror-finished surface. Applied technology of laser scattering achieves high sensitivity and high throughput detection of small contaminants and various types of defects on wafer surfaces prior to patterning. Wafer surface defects such as shallow scratch flatness defects, water marks, epi stacking faults, protrusions by the polishing process, and flatness defects caused during deposition cause problems in next-generation processes. The LS series achieve high sensitivity by detecting the light scattered from defects while suppressing background noise from the wafer surface. It is widely adopted to control contamination in the manufacturing of semiconductors on the 10-nm scale, and for delivery and incoming wafer quality control. For device manufacturer: incoming inspection and process tool monitoring use For tool and material manufacturer: process and material evaluation use For wafer supplier: outgoing inspection with wafer edge handling use

Suppliers

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Product
Description
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Wafer Surface Inspection System - LS Series - Hitachi High Technologies America, Inc.
Schaumburg, IL, USA
Wafer Surface Inspection System
LS Series
Wafer Surface Inspection System LS Series
The wafer surface inspection system LS series can detect defects on unpatterned wafers with a mirror-finished surface. Applied technology of laser scattering achieves high sensitivity and high throughput detection of small contaminants and various types of defects on wafer surfaces prior to patterning. Wafer surface defects such as shallow scratch flatness defects, water marks, epi stacking faults, protrusions by the polishing process, and flatness defects caused during deposition cause problems in next-generation processes. The LS series achieve high sensitivity by detecting the light scattered from defects while suppressing background noise from the wafer surface. It is widely adopted to control contamination in the manufacturing of semiconductors on the 10-nm scale, and for delivery and incoming wafer quality control. For device manufacturer: incoming inspection and process tool monitoring use For tool and material manufacturer: process and material evaluation use For wafer supplier: outgoing inspection with wafer edge handling use

The wafer surface inspection system LS series can detect defects on unpatterned wafers with a mirror-finished surface. Applied technology of laser scattering achieves high sensitivity and high throughput detection of small contaminants and various types of defects on wafer surfaces prior to patterning. Wafer surface defects such as shallow scratch flatness defects, water marks, epi stacking faults, protrusions by the polishing process, and flatness defects caused during deposition cause problems in next-generation processes. The LS series achieve high sensitivity by detecting the light scattered from defects while suppressing background noise from the wafer surface. It is widely adopted to control contamination in the manufacturing of semiconductors on the 10-nm scale, and for delivery and incoming wafer quality control.

  • For device manufacturer: incoming inspection and process tool monitoring use
  • For tool and material manufacturer: process and material evaluation use
  • For wafer supplier: outgoing inspection with wafer edge handling use
Supplier's Site

Technical Specifications

  Hitachi High Technologies America, Inc.
Product Category Wafer and Thin Film Instrumentation
Product Number LS Series
Product Name Wafer Surface Inspection System
Form Factor ProbingSystem
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