Fischer Technology, Inc. High Performance X-Ray Fluorescence Measuring Instrument with Vacuum Chamber for non-destructive Coating Thickness Measurement and Material Analysis FISCHERSCOPE® X-RAY XUV® 773

Description
The vacuum measurement chamber of devices in the XUV® range enables the verification of light materials from sodium onwards by means of X-ray fluorescence analysis (RFA). Because of the radiation-absorbing properties of room air, it is normally not possible to use this method. For this reason the instrument is ideal for very demanding coating thickness measurement and material analysis tasks. Features: Particularly suitable for research and development with their low detection limits, repeatable precision and universally upgradable measurement possibilities Vacuum chamber and high-performance silicon drift detector for precise measurement, even of light elements Automated serial testing with programmable X-, Y- and Z-axes Adaptable to the demands of various materials and measurement conditions by means of exchangeable apertures and filters Applications: Coating Thickness Measurement Layers of light elements from sodium onwards on the nm scale Aluminum and silicon layers Material Analysis Determination of the authenticity and provenance of precious stones General material analysis and forensics High-resolution trace analysis
Datasheet
Description
The vacuum measurement chamber of devices in the XUV® range enables the verification of light materials from sodium onwards by means of X-ray fluorescence analysis (RFA). Because of the radiation-absorbing properties of room air, it is normally not possible to use this method. For this reason the instrument is ideal for very demanding coating thickness measurement and material analysis tasks. Features: Particularly suitable for research and development with their low detection limits, repeatable precision and universally upgradable measurement possibilities Vacuum chamber and high-performance silicon drift detector for precise measurement, even of light elements Automated serial testing with programmable X-, Y- and Z-axes Adaptable to the demands of various materials and measurement conditions by means of exchangeable apertures and filters Applications: Coating Thickness Measurement Layers of light elements from sodium onwards on the nm scale Aluminum and silicon layers Material Analysis Determination of the authenticity and provenance of precious stones General material analysis and forensics High-resolution trace analysis
Datasheet

Suppliers

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High Performance X-Ray Fluorescence Measuring Instrument with Vacuum Chamber for non-destructive Coating Thickness Measurement and Material Analysis - FISCHERSCOPE® X-RAY XUV® 773 - Fischer Technology, Inc.
Windsor, CT, USA
High Performance X-Ray Fluorescence Measuring Instrument with Vacuum Chamber for non-destructive Coating Thickness Measurement and Material Analysis
FISCHERSCOPE® X-RAY XUV® 773
High Performance X-Ray Fluorescence Measuring Instrument with Vacuum Chamber for non-destructive Coating Thickness Measurement and Material Analysis FISCHERSCOPE® X-RAY XUV® 773
The vacuum measurement chamber of devices in the XUV® range enables the verification of light materials from sodium onwards by means of X-ray fluorescence analysis (RFA). Because of the radiation-absorbing properties of room air, it is normally not possible to use this method. For this reason the instrument is ideal for very demanding coating thickness measurement and material analysis tasks. Features: Particularly suitable for research and development with their low detection limits, repeatable precision and universally upgradable measurement possibilities Vacuum chamber and high-performance silicon drift detector for precise measurement, even of light elements Automated serial testing with programmable X-, Y- and Z-axes Adaptable to the demands of various materials and measurement conditions by means of exchangeable apertures and filters Applications: Coating Thickness Measurement Layers of light elements from sodium onwards on the nm scale Aluminum and silicon layers Material Analysis Determination of the authenticity and provenance of precious stones General material analysis and forensics High-resolution trace analysis

The vacuum measurement chamber of devices in the XUV® range enables the verification of light materials from sodium onwards by means of X-ray fluorescence analysis (RFA). Because of the radiation-absorbing properties of room air, it is normally not possible to use this method. For this reason the instrument is ideal for very demanding coating thickness measurement and material analysis tasks.

Features:

  • Particularly suitable for research and development with their low detection limits, repeatable precision and universally upgradable measurement possibilities
  • Vacuum chamber and high-performance silicon drift detector for precise measurement, even of light elements
  • Automated serial testing with programmable X-, Y- and Z-axes
  • Adaptable to the demands of various materials and measurement conditions by means of exchangeable apertures and filters

Applications:

Coating Thickness Measurement

  • Layers of light elements from sodium onwards on the nm scale
  • Aluminum and silicon layers

Material Analysis

  • Determination of the authenticity and provenance of precious stones
  • General material analysis and forensics
  • High-resolution trace analysis
Supplier's Site Datasheet

Technical Specifications

  Fischer Technology, Inc.
Product Category Nondestructive Testing (NDT) Equipment
Product Number FISCHERSCOPE® X-RAY XUV® 773
Product Name High Performance X-Ray Fluorescence Measuring Instrument with Vacuum Chamber for non-destructive Coating Thickness Measurement and Material Analysis
Instrument Technology Radiographic / X-ray
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