MacDermid Alpha Electronics Solutions Wafer Bumping Metallization solutions for Semiconductor Packaging MICROFAB ® CUMSA100

Description
Product Overview MICROFAB CUMSA100 enables high plating rates for high throughput, leading to a lower cost of ownership. This is achieved through a low consumption additive and simple, easy bath maintenance. The process produces equiaxed-grained matte copper deposits and is specially formulated for the fabrication of bumps/pillars on semiconductor wafers. High-build bumps/pillars can be produced on fine semiconductor patterns for excellent performance.
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Description
Product Overview MICROFAB CUMSA100 enables high plating rates for high throughput, leading to a lower cost of ownership. This is achieved through a low consumption additive and simple, easy bath maintenance. The process produces equiaxed-grained matte copper deposits and is specially formulated for the fabrication of bumps/pillars on semiconductor wafers. High-build bumps/pillars can be produced on fine semiconductor patterns for excellent performance.
Request a Quote

Suppliers

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Wafer Bumping Metallization solutions for Semiconductor Packaging - MICROFAB ® CUMSA100 - MacDermid Alpha Electronics Solutions
Waterbury, CT, United States
Wafer Bumping Metallization solutions for Semiconductor Packaging
MICROFAB ® CUMSA100
Wafer Bumping Metallization solutions for Semiconductor Packaging MICROFAB ® CUMSA100
Product Overview MICROFAB CUMSA100 enables high plating rates for high throughput, leading to a lower cost of ownership. This is achieved through a low consumption additive and simple, easy bath maintenance. The process produces equiaxed-grained matte copper deposits and is specially formulated for the fabrication of bumps/pillars on semiconductor wafers. High-build bumps/pillars can be produced on fine semiconductor patterns for excellent performance.

Product Overview

MICROFAB CUMSA100 enables high plating rates for high throughput, leading to a lower cost of ownership. This is achieved through a low consumption additive and simple, easy bath maintenance. The process produces equiaxed-grained matte copper deposits and is specially formulated for the fabrication of bumps/pillars on semiconductor wafers. High-build bumps/pillars can be produced on fine semiconductor patterns for excellent performance.

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Technical Specifications

  MacDermid Alpha Electronics Solutions
Product Category Plating Chemicals and Anodizing Chemicals
Product Number MICROFAB ® CUMSA100
Product Name Wafer Bumping Metallization solutions for Semiconductor Packaging
Chemical / Composition Hard Nickel Plating; Tin Plating; Soft / High Purity
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