Plasma Etch, Inc. Reactive Ion Etching System BT-1

Description
Benefits to you are better adhesion or marking, cleaner parts with less labor and reduced chemical expense by eliminating unwelcome and often expensive chemical waste associated with cleaning and priming. The large all aluminum chamber accommodates a generously sized active processing surface, our standard configuration of five levels of processing shelves provides you with 2100 square inches of useable plasma processing area.
Datasheet
Description
Benefits to you are better adhesion or marking, cleaner parts with less labor and reduced chemical expense by eliminating unwelcome and often expensive chemical waste associated with cleaning and priming. The large all aluminum chamber accommodates a generously sized active processing surface, our standard configuration of five levels of processing shelves provides you with 2100 square inches of useable plasma processing area.
Datasheet

Suppliers

Company
Product
Description
Supplier Links
Reactive Ion Etching System - BT-1 - Plasma Etch, Inc.
Carson City, NV, USA
Reactive Ion Etching System
BT-1
Reactive Ion Etching System BT-1
Benefits to you are better adhesion or marking, cleaner parts with less labor and reduced chemical expense by eliminating unwelcome and often expensive chemical waste associated with cleaning and priming. The large all aluminum chamber accommodates a generously sized active processing surface, our standard configuration of five levels of processing shelves provides you with 2100 square inches of useable plasma processing area.

Benefits to you are better adhesion or marking, cleaner parts with less labor and reduced chemical expense by eliminating unwelcome and often expensive chemical waste associated with cleaning and priming. The large all aluminum chamber accommodates a generously sized active processing surface, our standard configuration of five levels of processing shelves provides you with 2100 square inches of useable plasma processing area.

Datasheet

Technical Specifications

  Plasma Etch, Inc.
Product Category Thin Film Equipment
Product Number BT-1
Product Name Reactive Ion Etching System
Type Free Standing System
Process Plasma Etching and Cleaning
Applications Research / Surface Analysis; Printed Circuit Boards
Materials Processed Tungsten; Metal; Gallium Arsenide or Compound Semiconductors; Precious Metals
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