Deposition Sciences, Inc. Chemical Vapor Deposition

Description
PROCESS DESCRIPTION DSI has been producing complex functional thin film coatings on a variety of flexible substrates for over twenty years. Materials include metals, dielectrics, and multilayer optical coatings. DSI’s core enabling technology is an internally-developed batch coating process known as MicroDyn®. MicroDyn utilizes a proprietary magnetron sputtering chamber custom designed for high throughput processing. The unique MicroDyn batch process is not restricted by the line speed limitations and multi-pass transits associated with roll-to-roll systems—it can deposit hundreds of layers just as easily as a single layer. The MicroDyn process balances coating stress on both sides of the substrate, which aids in handling and increases coating durability. Through third parties, DSI also offers complex surface patterning using laser ablation. APPLICATIONS • Sunshade: A proprietary RF-transparent dielectric reflector with low solar heat gain • Metallization • Semiconductor multilayers • Oxide and Nitride multilayers BENEFITS • Very thick coatings • Lower processing temperatures • More complete reaction of oxides and nitrides • No rollers touch the front side of the substrate • High layer count • Complex coatings • Custom surface patterning
Description
PROCESS DESCRIPTION DSI has been producing complex functional thin film coatings on a variety of flexible substrates for over twenty years. Materials include metals, dielectrics, and multilayer optical coatings. DSI’s core enabling technology is an internally-developed batch coating process known as MicroDyn®. MicroDyn utilizes a proprietary magnetron sputtering chamber custom designed for high throughput processing. The unique MicroDyn batch process is not restricted by the line speed limitations and multi-pass transits associated with roll-to-roll systems—it can deposit hundreds of layers just as easily as a single layer. The MicroDyn process balances coating stress on both sides of the substrate, which aids in handling and increases coating durability. Through third parties, DSI also offers complex surface patterning using laser ablation. APPLICATIONS • Sunshade: A proprietary RF-transparent dielectric reflector with low solar heat gain • Metallization • Semiconductor multilayers • Oxide and Nitride multilayers BENEFITS • Very thick coatings • Lower processing temperatures • More complete reaction of oxides and nitrides • No rollers touch the front side of the substrate • High layer count • Complex coatings • Custom surface patterning

Suppliers

Company
Product
Description
Supplier Links
Chemical Vapor Deposition -  - Deposition Sciences, Inc.
Santa Rosa, CA, United States
Chemical Vapor Deposition
Chemical Vapor Deposition
PROCESS DESCRIPTION DSI has been producing complex functional thin film coatings on a variety of flexible substrates for over twenty years. Materials include metals, dielectrics, and multilayer optical coatings. DSI’s core enabling technology is an internally-developed batch coating process known as MicroDyn®. MicroDyn utilizes a proprietary magnetron sputtering chamber custom designed for high throughput processing. The unique MicroDyn batch process is not restricted by the line speed limitations and multi-pass transits associated with roll-to-roll systems—it can deposit hundreds of layers just as easily as a single layer. The MicroDyn process balances coating stress on both sides of the substrate, which aids in handling and increases coating durability. Through third parties, DSI also offers complex surface patterning using laser ablation. APPLICATIONS • Sunshade: A proprietary RF-transparent dielectric reflector with low solar heat gain • Metallization • Semiconductor multilayers • Oxide and Nitride multilayers BENEFITS • Very thick coatings • Lower processing temperatures • More complete reaction of oxides and nitrides • No rollers touch the front side of the substrate • High layer count • Complex coatings • Custom surface patterning

PROCESS DESCRIPTION

DSI has been producing complex functional thin film coatings on a variety of flexible substrates for over twenty years. Materials include metals, dielectrics, and multilayer optical coatings. DSI’s core enabling technology is an internally-developed batch coating process known as MicroDyn®. MicroDyn utilizes a proprietary magnetron sputtering chamber custom designed for high throughput processing. The unique MicroDyn batch process is not restricted by the line speed limitations and multi-pass transits associated with roll-to-roll systems—it can deposit hundreds of layers just as easily as a single layer. The MicroDyn process balances coating stress on both sides of the substrate, which aids in handling and increases coating durability. Through third parties, DSI also offers complex surface patterning using laser ablation.

APPLICATIONS
• Sunshade: A proprietary RF-transparent dielectric reflector with low solar heat gain
• Metallization
• Semiconductor multilayers
• Oxide and Nitride multilayers

BENEFITS
• Very thick coatings
• Lower processing temperatures
• More complete reaction of oxides and nitrides
• No rollers touch the front side of the substrate
• High layer count
• Complex coatings
• Custom surface patterning

Supplier's Site

Technical Specifications

  Deposition Sciences, Inc.
Product Category Thin Film Coating Services
Product Name Chemical Vapor Deposition
Company Information Deposition Sciences, Inc. (DSI®), a wholly owned subsidiary of Lockheed Martin, provides innovative, durable optical coating solutions for aerospace, commercial, and military customers. Applications include automotive, biomedical, astronomy, homeland security, imaging, telecommunications, scientific research, and industrial R&D. With lean manufacturing standards and talented engineers, we meet the diverse needs of customers who require cost-effective thin film coating solutions.
Capabilities Material Selection / Design Assistance; Chemical Vapor Deposition (CVD); Hard Coating
Certifications / Standards ISO 9001:2015 Certified, ITAR Registered and Compliant
Materials SiO2, Ta2O5, AI2O3
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