Thick positive photoresist designed for the requirements of grayscale lithography
Film thickness from 1 µm up to 60 µm and higher
High intensity laser exposure possible without out-gassing
50-60 µm depth range of patterns
Kayaku Advanced Materials, Inc.
Done
Request a Quote
Email Supplier
Description
Thick positive photoresist designed for the requirements of grayscale lithography
Film thickness from 1 µm up to 60 µm and higher
High intensity laser exposure possible without out-gassing
50-60 µm depth range of patterns
Thick positive photoresist designed for the requirements of grayscale lithography
Film thickness from 1 µm up to 60 µm and higher
High intensity laser exposure possible without out-gassing
50-60 µm depth range of patterns
Thick positive photoresist designed for the requirements of grayscale lithography
Film thickness from 1 µm up to 60 µm and higher
High intensity laser exposure possible without out-gassing
