Filmetrics, Inc. Thin Film Deposition Monitor F37 Series

Description
Measure film thickness in-line and in real-time at up to seven locations with the F37. Example Layers Almost any smooth and at-least-partially transparent films may be measured. This includes virtually any semiconducting material, including those used in thin-film photovoltaics. Example Layers MBE and MOCVD: Smooth and translucent, or lightly absorbing films, may be measured. This includes virtually any semiconducting material, from AIGaN to GaInAsP. Benefits: Dramatically improves productivity Low cost-Can pay for itself in months Accurate-Measure to better than ±1% Fast-Measurements in seconds Non-Invasive-Totally outside of deposition chamber Easy to use-Intuitive Windows™ software Turn-key system sets up in minutes
Description
Measure film thickness in-line and in real-time at up to seven locations with the F37. Example Layers Almost any smooth and at-least-partially transparent films may be measured. This includes virtually any semiconducting material, including those used in thin-film photovoltaics. Example Layers MBE and MOCVD: Smooth and translucent, or lightly absorbing films, may be measured. This includes virtually any semiconducting material, from AIGaN to GaInAsP. Benefits: Dramatically improves productivity Low cost-Can pay for itself in months Accurate-Measure to better than ±1% Fast-Measurements in seconds Non-Invasive-Totally outside of deposition chamber Easy to use-Intuitive Windows™ software Turn-key system sets up in minutes

Suppliers

Company
Product
Description
Supplier Links
Thin Film Deposition Monitor - F37 Series - Filmetrics, Inc.
San Diego, CA, USA
Thin Film Deposition Monitor
F37 Series
Thin Film Deposition Monitor F37 Series
Measure film thickness in-line and in real-time at up to seven locations with the F37. Example Layers Almost any smooth and at-least-partially transparent films may be measured. This includes virtually any semiconducting material, including those used in thin-film photovoltaics. Example Layers MBE and MOCVD: Smooth and translucent, or lightly absorbing films, may be measured. This includes virtually any semiconducting material, from AIGaN to GaInAsP. Benefits: Dramatically improves productivity Low cost-Can pay for itself in months Accurate-Measure to better than ±1% Fast-Measurements in seconds Non-Invasive-Totally outside of deposition chamber Easy to use-Intuitive Windows™ software Turn-key system sets up in minutes

Measure film thickness in-line and in real-time at up to seven locations with the F37.

Example Layers

Almost any smooth and at-least-partially transparent films may be measured. This includes virtually any semiconducting material, including those used in thin-film photovoltaics.

Example Layers

MBE and MOCVD: Smooth and translucent, or lightly absorbing films, may be measured. This includes virtually any semiconducting material, from AIGaN to GaInAsP.

Benefits:

  • Dramatically improves productivity
  • Low cost-Can pay for itself in months
  • Accurate-Measure to better than ±1%
  • Fast-Measurements in seconds
  • Non-Invasive-Totally outside of deposition chamber
  • Easy to use-Intuitive Windows™ software
  • Turn-key system sets up in minutes
Supplier's Site

Technical Specifications

  Filmetrics, Inc.
Product Category Wafer and Thin Film Instrumentation
Product Number F37 Series
Product Name Thin Film Deposition Monitor
Form Factor Monitor or instrument
Mounting / Loading In-line
Technology Spectrometer (SIMS, XRF, FTIR, DLTS, AAS); Spectral Reflectance
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