The Most Powerful Tool Available for Monitoring Thin-Film Deposition
Measure deposition rates, film thickness, optical constants (n and k), and uniformity of semiconductors and dielectric layers in real-time with the F30 spectral reflectance system.
Example Layers
MBE and MOCVD: Smooth and translucent, or lightly absorbing films, may be measured. This includes virtually any semiconducting material, from AIGaN to GaInAsP.
Benefits:
Dramatically improves productivity
Low cost - Can pay for itself in months
Accurate - Measure to better than ±1%
Fast-Measurements in seconds
Non-Invasive - Totally outside of deposition chamber
Easy to use - Intuitive Windows™ software
Turn-key system sets up in minutes
The Most Powerful Tool Available for Monitoring Thin-Film Deposition
Measure deposition rates, film thickness, optical constants (n and k), and uniformity of semiconductors and dielectric layers in real-time with the F30 spectral reflectance system.
Example Layers
MBE and MOCVD: Smooth and translucent, or lightly absorbing films, may be measured. This includes virtually any semiconducting material, from AIGaN to GaInAsP.
Benefits:
- Dramatically improves productivity
- Low cost - Can pay for itself in months
- Accurate - Measure to better than ±1%
- Fast-Measurements in seconds
- Non-Invasive - Totally outside of deposition chamber
- Easy to use - Intuitive Windows™ software
- Turn-key system sets up in minutes
