MacDermid Alpha Electronics Solutions Wafer Bumping Metallization solutions for Semiconductor Packaging MICROFAB ® GSW-200

Description
Product Overview MICROFAB GSW-200 is a mid-purity plating system that works with or without a Ni barrier. Its ability to level pads reduces solder usage, lowering the cost of ownership. The process produces bright, fine-grained, ductile deposits with excellent physical properties. It enables complete via filling, minimizes surface deposition, reduces cycle time, and eliminates the need for planarization. This process supports stacked via constructions and enhances reliability for via-in-pad designs.
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Description
Product Overview MICROFAB GSW-200 is a mid-purity plating system that works with or without a Ni barrier. Its ability to level pads reduces solder usage, lowering the cost of ownership. The process produces bright, fine-grained, ductile deposits with excellent physical properties. It enables complete via filling, minimizes surface deposition, reduces cycle time, and eliminates the need for planarization. This process supports stacked via constructions and enhances reliability for via-in-pad designs.
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Suppliers

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Wafer Bumping Metallization solutions for Semiconductor Packaging - MICROFAB ® GSW-200 - MacDermid Alpha Electronics Solutions
Waterbury, CT, United States
Wafer Bumping Metallization solutions for Semiconductor Packaging
MICROFAB ® GSW-200
Wafer Bumping Metallization solutions for Semiconductor Packaging MICROFAB ® GSW-200
Product Overview MICROFAB GSW-200 is a mid-purity plating system that works with or without a Ni barrier. Its ability to level pads reduces solder usage, lowering the cost of ownership. The process produces bright, fine-grained, ductile deposits with excellent physical properties. It enables complete via filling, minimizes surface deposition, reduces cycle time, and eliminates the need for planarization. This process supports stacked via constructions and enhances reliability for via-in-pad designs.

Product Overview

MICROFAB GSW-200 is a mid-purity plating system that works with or without a Ni barrier. Its ability to level pads reduces solder usage, lowering the cost of ownership.

The process produces bright, fine-grained, ductile deposits with excellent physical properties. It enables complete via filling, minimizes surface deposition, reduces cycle time, and eliminates the need for planarization.

This process supports stacked via constructions and enhances reliability for via-in-pad designs.

Supplier's Site

Technical Specifications

  MacDermid Alpha Electronics Solutions
Product Category Plating Chemicals and Anodizing Chemicals
Product Number MICROFAB ® GSW-200
Product Name Wafer Bumping Metallization solutions for Semiconductor Packaging
Chemical / Composition Copper Plating; Hard Nickel Plating; Tin Plating
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