The TWINSCAN XT:870G 248-nm Step-and-Scan system is a high-productivity, dual-stage KrF lithography tool designed for volume 300-mm wafer production at and below 110-nm resolution. Combining the imaging power of a variable 0.55-0.80-NA Carl Zeiss Starlith 870 4X reduction lens with AERIAL II and the optional QUASAR XL Illuminator technology, the XT:870G extends volume-proven KrF technology to 100-nm applications. Highly line-narrowed 30-W KrF lasers with variable frequency control, in combination with the high optical transmission of the optical system, provide a production throughput of 150 300-mm wph with the lowest possible cost of operation.
| ASML Optics | |
|---|---|
| Product Category | Lithography Equipment |
| Product Number | TWINSCAN XT:870G |
| Product Name | Lithography System |
