ASML Optics Lithography System PAS 5500/450F

Description
The PAS 5500/450F is the latest and most advanced addition to the i-line Step-and-Scan family. This mass production tool is the successor of the PAS 5500/400 for non-critical applications. This tool is extendable to critical i-line down to 220 nm. The PAS 5500/450F combines the imaging power of a variable 0.48-0.65-NA Carl Zeiss Starlith 4X reduction lens with a high speed scanning stage to deliver a high productivity tool with a superior value of ownership for maximum yield. The modular PAS 5500 platform typically ensures future extendibility for productivity, imaging and overlay. The system is fully configurable to meet production requirements and offers both ease-of-manufacturin g and cost-effectiveness in a high-volume production environment. The PAS 5500/450F continues to raise the bar for imaging performance and productivity in the 200-mm litho market.
  • Lithography System - PAS 5500/450F - ASML Optics
    ASML Optics
Description
The PAS 5500/450F is the latest and most advanced addition to the i-line Step-and-Scan family. This mass production tool is the successor of the PAS 5500/400 for non-critical applications. This tool is extendable to critical i-line down to 220 nm. The PAS 5500/450F combines the imaging power of a variable 0.48-0.65-NA Carl Zeiss Starlith 4X reduction lens with a high speed scanning stage to deliver a high productivity tool with a superior value of ownership for maximum yield. The modular PAS 5500 platform typically ensures future extendibility for productivity, imaging and overlay. The system is fully configurable to meet production requirements and offers both ease-of-manufacturin g and cost-effectiveness in a high-volume production environment. The PAS 5500/450F continues to raise the bar for imaging performance and productivity in the 200-mm litho market.

Suppliers

Company
Product
Description
Supplier Links
Lithography System - PAS 5500/450F - ASML Optics
ASML Optics
Wilton, CT, USA
Lithography System
PAS 5500/450F
Lithography System PAS 5500/450F
The PAS 5500/450F is the latest and most advanced addition to the i-line Step-and-Scan family. This mass production tool is the successor of the PAS 5500/400 for non-critical applications. This tool is extendable to critical i-line down to 220 nm. The PAS 5500/450F combines the imaging power of a variable 0.48-0.65-NA Carl Zeiss Starlith 4X reduction lens with a high speed scanning stage to deliver a high productivity tool with a superior value of ownership for maximum yield. The modular PAS 5500 platform typically ensures future extendibility for productivity, imaging and overlay. The system is fully configurable to meet production requirements and offers both ease-of-manufacturin g and cost-effectiveness in a high-volume production environment. The PAS 5500/450F continues to raise the bar for imaging performance and productivity in the 200-mm litho market.

The PAS 5500/450F is the latest and most advanced addition to the i-line Step-and-Scan family. This mass production tool is the successor of the PAS 5500/400 for non-critical applications. This tool is extendable to critical i-line down to 220 nm. The PAS 5500/450F combines the imaging power of a variable 0.48-0.65-NA Carl Zeiss Starlith 4X reduction lens with a high speed scanning stage to deliver a high productivity tool with a superior value of ownership for maximum yield.

The modular PAS 5500 platform typically ensures future extendibility for productivity, imaging and overlay. The system is fully configurable to meet production requirements and offers both ease-of-manufacturing and cost-effectiveness in a high-volume production environment.

The PAS 5500/450F continues to raise the bar for imaging performance and productivity in the 200-mm litho market.

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Technical Specifications

  ASML Optics
Product Category Lithography Equipment
Product Number PAS 5500/450F
Product Name Lithography System
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