The TWINSCAN XT:1700Fi Step-and-Scan system is a high-productivity, dual-stage immersion lithography tool designed for volume 300-mm wafer production at 50-nm resolution and below. One of the main features is a 1.2-NA in-line catadioptric lens. This compact mechanically stable lens design has the same image orientation as refractive designs, allowing for full reticle compatibility between current refractive designs and the XT:1700Fi. The illuminator features polarization at maximum throughput, and extremely homogeneous pupil fill, perfectly adapted to ultra low-k1 pupil shapes. Standard as well as customized illumination modes can be enhanced by optimizing the polarization mode, to maximize the contrast and reducing the mask error factor per application. Overlay and focus requirements are in line with the resolution node.
A next step in stage technology features faster acceleration and minimization of immersion related overhead, leading to a throughput of 122 wph. Adding to the benefit of polarization, the XT:1700Fi comes equipped with an extended Ultra-k1 package, consisting of QUASAR XL, LithoGuide, ILIAS, DoseMapper, Reticle Shape Correction, CDFEC and Focus Spot Monitor.
| ASML Optics | |
|---|---|
| Product Category | Lithography Equipment |
| Product Number | TWINSCAN XT:1700Fi |
| Product Name | Lithography System |
