ASML Optics Lithography System PAS 5500/100D

Description
The pas 5500/100D i-line stepper is designed for mass production at 0.4μm and achieves extremely high throughput while maintaining the utmost versatility with its variable Numerical Aperture (NA). This stepper extends i-line’s capability for manufacturing multiple generations of sub-halfmicron design rules by optimising both depth of focus and resolution for critical process layers.
Description
The pas 5500/100D i-line stepper is designed for mass production at 0.4μm and achieves extremely high throughput while maintaining the utmost versatility with its variable Numerical Aperture (NA). This stepper extends i-line’s capability for manufacturing multiple generations of sub-halfmicron design rules by optimising both depth of focus and resolution for critical process layers.

Suppliers

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Lithography System - PAS 5500/100D - ASML Optics
Wilton, CT, USA
Lithography System
PAS 5500/100D
Lithography System PAS 5500/100D
The pas 5500/100D i-line stepper is designed for mass production at 0.4μm and achieves extremely high throughput while maintaining the utmost versatility with its variable Numerical Aperture (NA). This stepper extends i-line’s capability for manufacturing multiple generations of sub-halfmicron design rules by optimising both depth of focus and resolution for critical process layers.

The pas 5500/100D i-line stepper is designed for mass production at 0.4μm and achieves extremely high throughput while maintaining the utmost versatility with its variable Numerical Aperture (NA). This stepper extends i-line’s capability for manufacturing multiple generations of sub-halfmicron design rules by optimising both depth of focus and resolution for critical process layers.

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Technical Specifications

  ASML Optics
Product Category Lithography Equipment
Product Number PAS 5500/100D
Product Name Lithography System
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