The TWINSCAN XT:1900Gi Step-and-Scan system is a high-productivity, dual-stage immersion lithography tool designed for volume 300-mm wafer production at 45-nm resolution and below. Building on the successful in-line catadioptric lens design concept first employed in the XT:1700Fi this system offers the highest NA in the industry: 1.35. The compact mechanically stable lens design has the same image orientation as refractive designs, allowing for full reticle compatibility between refractive designs as well as the XT:1700Fi. The illuminator features polarization at maximum throughput, and extremely homogeneous pupil fill, perfectly adapted to ultra low-k1 pupil shapes.
Standard as well as customized illumination modes can be enhanced by optimizing the polarization mode, to maximize the contrast and reducing the mask error factor per application. Overlay and focus performance are improved in line with the resolution node. Besides polarization capability, the XT:1900Gi comes equipped with an extended Ultra-k1 package, consisting of QUASAR XL, LithoGuide ILIAS, DoseMapper, Reticle Shape Correction, CDFEC and Focus Spot Monitor.
| ASML Optics | |
|---|---|
| Product Category | Lithography Equipment |
| Product Number | TWINSCAN XT:1900Gi |
| Product Name | Lithography System |
